Thermal Activation of Electrochemical Seed Surfaces for Selective and Tunable Hydrophobic Patterning.

Speidel, Alistair; Murray, James W; Bisterov, Ivan; Mitchell-Smith, Jonathon; Parmenter, Christopher; Clare, Adam T

Speidel, Alistair; Murray, James W; Bisterov, Ivan; Mitchell-Smith, Jonathon; Parmenter, Christopher; Clare, Adam T.

Afiliación

Speidel A; Advanced Component Engineering Laboratory, Faculty of Engineering , University of Nottingham , Jubilee Campus, Nottingham NG8 1BB , U.K.
Murray JW; Advanced Component Engineering Laboratory, Faculty of Engineering , University of Nottingham , Jubilee Campus, Nottingham NG8 1BB , U.K.
Bisterov I; Advanced Component Engineering Laboratory, Faculty of Engineering , University of Nottingham , Jubilee Campus, Nottingham NG8 1BB , U.K.
Mitchell-Smith J; Texture Jet Ltd. , Sir Colin Campbell Building, Innovation Park, Triumph Road, Nottingham NG7 2TU , U.K.
Parmenter C; Texture Jet Ltd. , Sir Colin Campbell Building, Innovation Park, Triumph Road, Nottingham NG7 2TU , U.K.
Clare AT; Nanoscale and Microscale Research Centre , University of Nottingham , University Park, Nottingham NG7 2RD , U.K.

ACS Appl Mater Interfaces ; 12(6): 7744-7759, 2020 Feb 12.

Article en En | MEDLINE | ID: mdl-31977174

Palabras clave

backscattered electron; electrochemical jet processing; focus variation microscopy; high-current pulsed electron beam; interelectrode gap; water contact angles

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Texto completo: 1 Bases de datos: MEDLINE Idioma: En Revista: ACS Appl Mater Interfaces Asunto de la revista: BIOTECNOLOGIA / ENGENHARIA BIOMEDICA Año: 2020 Tipo del documento: Article País de afiliación: Reino Unido

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