Broad-beam plasma-cathode electron beam source based on a cathodic arc for beam generation over a wide pulse-width range.

We describe the design, parameters, and characteristics of a modified wide-aperture, plasma-cathode electron beam source operating in the pressure range of 3 Pa-30 Pa and generating large-radius, low-energy (up to 10 keV) electron beams with a pulse width varying from 0.05 ms to 20 ms and a beam current up to several tens of amperes. A pulsed cathodic arc is used to generate the emission plasma, and a DC accelerating voltage is used to form the electron beam. Modernization of the design and optimization of the operating conditions of the electron source have provided a multiple increase in the pulse duration of the electron beam current and the corresponding increase in the beam energy per pulse, as compared to previously developed pulsed forevacuum electron sources.

Multifunctional bulk plasma source based on discharge with electron injection.

A bulk plasma source, based on a high-current dc glow discharge with electron injection, is described. Electron injection and some special design features of the plasma arc emitter provide a plasma source with very long periods between maintenance down-times and a long overall lifetime. The source uses a sectioned sputter-electrode array with six individual sputter targets, each of which can be independently biased. This discharge assembly configuration provides multifunctional operation, including plasma generation from different gases (argon, nitrogen, oxygen, acetylene) and deposition of composite metal nitride and oxide coatings.