RESUMO
There are few materials that are broadly used for fabricating optical metasurfaces for visible light applications. Gallium phosphide (GaP) is a material that, due to its optical properties, has the potential to become a primary choice but due to the difficulties in fabrication, GaP thin films deposited on transparent substrates have never been exploited. In this article we report the design, fabrication, and characterization of three different amorphous GaP metasurfaces obtained through sputtering. Although the material properties can be further optimized, our results show the potential of this material for visible applications making it a viable alternative in the material selection for optical metasurfaces.
RESUMO
Metasurfaces have facilitated the replacement of conventional optical elements with ultrathin and planar photonic structures. Previous designs of metasurfaces were limited to small deflection angles and small ranges of the angle of incidence. Here, we have created two types of Si-based metasurfaces to steer visible light to a large deflection angle. These structures exhibit high diffraction efficiencies over a broad range of angles of incidence. We have demonstrated metasurfaces working both in transmission and reflection modes based on conventional thin film silicon processes that are suitable for the large-scale fabrication of high-performance devices.
RESUMO
A new generalized nonlinear Schrödinger equation describing the propagation of ultrashort pulses in bulk media exhibiting frequency dependent dielectric susceptibility and magnetic permeability is derived and used to characterize wave propagation in a negative index material. The equation has new features that are distinct from ordinary materials (mu=1): the linear and nonlinear coefficients can be tailored through the linear properties of the medium to attain any combination of signs unachievable in ordinary matter, with significant potential to realize a wide class of solitary waves.