Soft-X-ray nanobeams formed by aberration-reduced elliptical mirrors with large numerical aperture.

X-ray focusing mirrors often employ the Kirkpatrick-Baez (KB) geometry, which sequentially crosses two elliptic-cylindrical mirrors in grazing-incidence configurations. However, KB mirrors do not satisfy the Abbe sine condition and thus potentially expand the focus size with severe coma aberration. Satisfying the Abbe sine condition complicates mirror shapes or increases the number of ultraprecision mirrors required. The present study shows that the focal length and mirror length of KB mirrors have to be shortened to simultaneously achieve a large numerical aperture and reduced aberration. Such ultracompact KB (ucKB) mirrors are examined using a simulation that combines ray tracing and wave propagation. The focus intensity distributions show that ucKB mirrors suppress the aberration produced by their rotation errors and that they robustly achieve diffraction-limited focusing. The simulation results are confirmed in a synchrotron radiation experiment. ucKB mirrors can be advantageous for soft-X-ray nanoprobes, which require focusing devices to achieve a large numerical aperture.

Ultracompact mirror device for forming 20-nm achromatic soft-X-ray focus toward multimodal and multicolor nanoanalyses.

Nanoscale soft-X-ray microscopy is a powerful analysis tool in biological, chemical, and physical sciences. To enhance its probe sensitivity and leverage multimodal soft-X-ray microscopy, precise achromatic focusing devices, which are challenging to fabricate, are essential. Here, we develop an ultracompact Kirkpatrick-Baez (ucKB) mirror, which is ideal for the high-performance nanofocusing of broadband-energy X-rays. We apply our advanced fabrication techniques and short-focal-length strategy to realize diffraction-limited focusing over the entire soft-X-ray range. We achieve a focus size of 20.4 nm at 2 keV, which represents a significant improvement in achromatic soft-X-ray focusing. The ucKB mirror extends soft-X-ray fluorescence microscopy by producing a bicolor nanoprobe with a 1- or 2-keV photon energy. We propose a subcellular chemical mapping method that allows a comprehensive analysis of specimen morphology and the distribution of light elements and metal elements. ucKB mirrors will improve soft-X-ray nanoanalyses by facilitating photon-hungry, multimodal, and polychromatic methods, even with table-top X-ray sources.

Abrasive slurry jet machining system using polyurethane@silica core-shell particles for internal surfaces of axisymmetric x-ray mirrors.

Abrasive machining has been used for inner surface processing of various hollow components. In this study, we applied an in-air fluid jet as a precision machining method for the inner surface of an axisymmetric x-ray mirror whose inner diameter was less than 10 mm. We employed an abrasive with a polyurethane@silica core-shell structure, which has a low density of about 1.2 g/cm3 and a relatively large particle size of about 15 µm. By using this abrasive, a practical removal rate and a smooth machined surface were simultaneously obtained. We performed figure corrections for an axisymmetric mirror and improved the circumferential figure accuracy to a sub-10 nm root mean square level. To evaluate the machining performance in the longitudinal direction of the ellipsoidal surface, we also performed periodic figure fabrication on the inner surface of a 114 mm-long nickel ellipsoidal mirror. X-ray ptychography, an optical phase retrieval method, was also employed as a three-dimensional figure measurement technique of the mirror. The wavefield of the x-ray beam focused by the processed ellipsoidal mirror was observed with the ptychographic system at SPring-8, a synchrotron radiation facility. The retrieval calculations for the wavefront error confirmed that a sinusoidal waveform with a period of 12 mm was fabricated on the mirror surface. These experimental results suggest that a nanoscale figure fabrication cycle for the inner surface consisting of jet machining and wavefront measurement has been successfully constructed. We expect this technique to be utilized in the fabrication of error-free optical mirrors and various parts having hollow shapes.

Fabrication of ultrashort sub-meter-radius x-ray mirrors using dynamic stencil deposition with figure correction.

This paper presents nanometer-scale production and metrology methods for elliptic-cylindrical x-ray mirrors with an unprecedentedly small tangential radius of curvature of 160 mm. Sub-millimeter-scale figure correction is conducted based on dynamic stencil deposition. The deposition flux through one or two shadow masks is examined by a comparison to a simple model. The masked deposition flux distribution is improved, leading to film thickness profiles that are 50 times sharper in terms of aspect ratio than those obtained using existing differential deposition approaches. Surface roughness deterioration is also effectively suppressed. A 2-mm-long 160-mm-radius mirror is produced with a width of 10 mm and measured using simple interferometry. The results are confirmed by conventional mirror metrology, contact profilometry, and x-ray ptychography. The x-ray focusing profile is diffraction-limited with a 142-nm focus size at a photon energy of 300 eV. The proposed methods have the potential to enhance the ultraprecise fabrication of highly curved mirrors, thus benefiting nanoscale photon-hungry x-ray techniques.