Numerical investigation of side emission from large-area vertical-cavity surface-emitting lasers.

For large-area ion-implanted vertical-cavity surface-emitting lasers (VCSELs), side emission from the edges of a chip disturbs the laser emission of a VCSEL mode, and suppression of it is fundamental. In this paper, we present results of a numerical investigation of the side emission from large-area VCSELs. We have modeled a VCSEL structure by an infinitely broad layer structure with mirror loss at the edge surfaces. Estimated threshold gains indicate that laser emission occurs either in a VCSEL mode or in an edge-emitting Fabry-Perot (EEFP) mode. Calculated emitter length dependence of the threshold gain of these modes shows good agreement with experimental results, and the side emission is verified to be the laser emission of the EEFP mode. We have also discussed the way to suppress the side emission and confirmed that our recent achievement of over 200 W quasi-continuous-wave output from an ion-implanted VCSEL array is due to antireflection coatings of the edges and introduction of optical losses in ex-emitter regions.

A 340-nm-band ultraviolet laser diode composed of GaN well layers.

We have demonstrated the laser operation of a short-wavelength ultraviolet laser diode with multiple-quantum-wells composed of GaN well layers. The laser action has been achieved in 340-nm-band far from the wavelength corresponding to GaN band gap under the pulsed current mode at room temperature. The device has been realized on the Al(0.2)Ga(0.8)N underlying layer. The AlN mole fraction of the underlying layer is 0.1 lower than that of the underlying layer which was used for the previously reported 342 nm laser diode. These results provide a chance to the next step for a shorter-wavelength ultraviolet laser diode.

High power density vertical-cavity surface-emitting lasers with ion implanted isolated current aperture.

We report on GaAs-based high power density vertical-cavity surface-emitting laser diodes (VCSELs) with ion implanted isolated current apertures. A continuous-wave output power of over 380 mW and the power density of 4.9 kW/cm2 have been achieved at 15 °C from the 100-µm-diameter aperture, which is the highest output characteristic ever reported for an ion implanted VCSEL. A high background suppression ratio of over 40 dB has also been obtained at the emission wavelength of 970 nm. The ion implantation technique provides an excellent current isolation in the apertures and would be a key to realize high power output from a VCSEL array.