Detalhe da pesquisa
1.
Etch characteristics of Si and TiO2 nanostructures using pulse biased inductively coupled plasmas.
Nanotechnology
; 31(26): 265302, 2020 Apr 09.
Artigo
em Inglês
| MEDLINE | ID: mdl-32131063
2.
Highly oxidation-resistant silver nanowires by C x F y polymers using plasma treatment.
Nanotechnology
; 30(28): 285702, 2019 Jul 12.
Artigo
em Inglês
| MEDLINE | ID: mdl-30893668
3.
Plasma treatment of thin film coated with graphene flakes for the reduction of sheet resistance.
J Nanosci Nanotechnol
; 13(12): 8090-4, 2013 Dec.
Artigo
em Inglês
| MEDLINE | ID: mdl-24266197
4.
Etch characteristics of magnetic tunnel junction materials using bias pulsing in the CH4/N2O inductively coupled plasma.
J Nanosci Nanotechnol
; 14(12): 9541-7, 2014 Dec.
Artigo
em Inglês
| MEDLINE | ID: mdl-25971096
5.
Effect of RF pulsing biasing on the etching of magnetic tunnel junction materials using CH3OH.
J Nanosci Nanotechnol
; 14(12): 9680-5, 2014 Dec.
Artigo
em Inglês
| MEDLINE | ID: mdl-25971119