Increased sensitivity to in-plane displacements in electronic speckle pattern interferometry.
Appl Opt
; 34(16): 2880-5, 1995 Jun 01.
Article
em En
| MEDLINE
| ID: mdl-21052437
ABSTRACT
We describe an optical arrangement that increases the sensitivity to in-plane displacement in an electronic speckle-pattern interferometric system. This is accomplished by oblique illumination and observation along the direction of illumination. An anamorphic prism placed in front of the object is used to correct for the eccentricity in the image caused by the oblique observation. The sensitivity to in-plane displacement can be increased to a maximum of approximately λ/2. Experimental results including phase stepping are presented.
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Base de dados:
MEDLINE
Tipo de estudo:
Diagnostic_studies
Idioma:
En
Revista:
Appl Opt
Ano de publicação:
1995
Tipo de documento:
Article