Colloidal lithography using silica particles: improved particle distribution and tunable wetting properties.

Degand, Simon; Lamblin, Guillaume; Dupont-Gillain, Christine C

Degand, Simon; Lamblin, Guillaume; Dupont-Gillain, Christine C.

Afiliação

Degand S; Université catholique de Louvain (UCL), Institute of Condensed Matter and Nanosciences (IMCN), Division "Bio & Soft Matter" (BSMA), Croix du Sud 1(L7.04.01), B-1348 Louvain-la-Neuve, Belgium.
Lamblin G; Université catholique de Louvain (UCL), Institute of Condensed Matter and Nanosciences (IMCN), Division "Bio & Soft Matter" (BSMA), Croix du Sud 1(L7.04.01), B-1348 Louvain-la-Neuve, Belgium.
Dupont-Gillain CC; Université catholique de Louvain (UCL), Institute of Condensed Matter and Nanosciences (IMCN), Division "Bio & Soft Matter" (BSMA), Croix du Sud 1(L7.04.01), B-1348 Louvain-la-Neuve, Belgium. Electronic address: christine.dupont@uclouvain.be.

J Colloid Interface Sci ; 392: 219-225, 2013 Feb 15.

Article em En | MEDLINE | ID: mdl-23141705

Assuntos

Dióxido de Silício/química; Coloides/química; Tamanho da Partícula; Propriedades de Superfície; Molhabilidade

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Texto completo: 1 Base de dados: MEDLINE Assunto principal: Dióxido de Silício Idioma: En Revista: J Colloid Interface Sci Ano de publicação: 2013 Tipo de documento: Article País de afiliação: Bélgica

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