Ultra-thin resistive switching oxide layers self-assembled by field-induced oxygen migration (FIOM) technique.

Lee, Sangik; Hwang, Inrok; Oh, Sungtaek; Hong, Sahwan; Kim, Yeonsoo; Nam, Yoonseung; Lee, Keundong; Yoon, Chansoo; Kim, Wondong; Park, Bae Ho.

Afiliação

Lee S; Division of Quantum Phases &Devices, Department of Physics, Konkuk University, Seoul. 143-701, Korea.
Hwang I; Electronic Materials Research Center, Korea Institute of Science and Technology (KIST), Seoul. 136-791, Korea.
Oh S; Division of Quantum Phases &Devices, Department of Physics, Konkuk University, Seoul. 143-701, Korea.
Hong S; Division of Quantum Phases &Devices, Department of Physics, Konkuk University, Seoul. 143-701, Korea.
Kim Y; Division of Quantum Phases &Devices, Department of Physics, Konkuk University, Seoul. 143-701, Korea.
Nam Y; Division of Quantum Phases &Devices, Department of Physics, Konkuk University, Seoul. 143-701, Korea.
Lee K; Division of Quantum Phases &Devices, Department of Physics, Konkuk University, Seoul. 143-701, Korea.
Yoon C; Division of Quantum Phases &Devices, Department of Physics, Konkuk University, Seoul. 143-701, Korea.
Kim W; Korea Research Institute of Standards and Science (KRISS), Daejeon. 305-340, Korea.
Park BH; Division of Quantum Phases &Devices, Department of Physics, Konkuk University, Seoul. 143-701, Korea.

Sci Rep ; 4: 6871, 2014 Nov 03.

Article em En | MEDLINE | ID: mdl-25362933

Texto completo: 1 Base de dados: MEDLINE Idioma: En Revista: Sci Rep Ano de publicação: 2014 Tipo de documento: Article

Texto completo: 1 Base de dados: MEDLINE Idioma: En Revista: Sci Rep Ano de publicação: 2014 Tipo de documento: Article