Your browser doesn't support javascript.
loading
How important is the {103} plane of stable Ge2 Sb2 Te5 for phase-change memory?
Zhang, W; Zheng, W T; Kim, J-G; Cui, X Q; Li, L; Qi, J G; Kim, Y-J; Song, S A.
Afiliação
  • Zhang W; Department of Materials Science, and Key Laboratory of Mobile Materials MOE, and State Key Laboratory of Superhard Materials, Jilin University, Changchun, China.
  • Zheng WT; Computational and Analytical Science Center, Samsung Advanced Institute of Technology, Yongin, South Korea.
  • Kim JG; Department of Materials Science, and Key Laboratory of Mobile Materials MOE, and State Key Laboratory of Superhard Materials, Jilin University, Changchun, China.
  • Cui XQ; Korea Basic Science Institute, Daejeon, South Korea.
  • Li L; Department of Materials Science, and Key Laboratory of Mobile Materials MOE, and State Key Laboratory of Superhard Materials, Jilin University, Changchun, China.
  • Qi JG; School of Electronic and Information Engineering, Changchun University, Changchun, China.
  • Kim YJ; School of Material Science & Engineering, Liaoning University of Technology, Jinzhou, China.
  • Song SA; Korea Basic Science Institute, Daejeon, South Korea.
J Microsc ; 259(1): 10-5, 2015 Jul.
Article em En | MEDLINE | ID: mdl-25809085

Texto completo: 1 Base de dados: MEDLINE Idioma: En Revista: J Microsc Ano de publicação: 2015 Tipo de documento: Article País de afiliação: China

Texto completo: 1 Base de dados: MEDLINE Idioma: En Revista: J Microsc Ano de publicação: 2015 Tipo de documento: Article País de afiliação: China