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Development of a microwave ion source for ion implantations.
Takahashi, N; Murata, H; Kitami, H; Mitsubori, H; Sakuraba, J; Soga, T; Aoki, Y; Katoh, T.
Afiliação
  • Takahashi N; Technology Research Center, Sumitomo Heavy Industries Ltd., Yokosuka, Kanagawa 237-8555, Japan.
  • Murata H; Technology Research Center, Sumitomo Heavy Industries Ltd., Yokosuka, Kanagawa 237-8555, Japan.
  • Kitami H; Technology Research Center, Sumitomo Heavy Industries Ltd., Yokosuka, Kanagawa 237-8555, Japan.
  • Mitsubori H; Technology Research Center, Sumitomo Heavy Industries Ltd., Yokosuka, Kanagawa 237-8555, Japan.
  • Sakuraba J; Technology Research Center, Sumitomo Heavy Industries Ltd., Yokosuka, Kanagawa 237-8555, Japan.
  • Soga T; Technology Research Center, Sumitomo Heavy Industries Ltd., Yokosuka, Kanagawa 237-8555, Japan.
  • Aoki Y; Technology Research Center, Sumitomo Heavy Industries Ltd., Yokosuka, Kanagawa 237-8555, Japan.
  • Katoh T; Technology Research Center, Sumitomo Heavy Industries Ltd., Yokosuka, Kanagawa 237-8555, Japan.
Rev Sci Instrum ; 87(2): 02C108, 2016 Feb.
Article em En | MEDLINE | ID: mdl-26932118
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Texto completo: 1 Base de dados: MEDLINE Idioma: En Revista: Rev Sci Instrum Ano de publicação: 2016 Tipo de documento: Article País de afiliação: Japão
Texto completo
Imprimir
XML
PubMed Links
Buscar no Google

Texto completo: 1 Base de dados: MEDLINE Idioma: En Revista: Rev Sci Instrum Ano de publicação: 2016 Tipo de documento: Article País de afiliação: Japão