Area-Selective Atomic Layer Deposition of Metal Oxides on Noble Metals through Catalytic Oxygen Activation.

Singh, Joseph A; Thissen, Nick F W; Kim, Woo-Hee; Johnson, Hannah; Kessels, Wilhelmus M M; Bol, Ageeth A; Bent, Stacey F; Mackus, Adriaan J M

Singh, Joseph A; Thissen, Nick F W; Kim, Woo-Hee; Johnson, Hannah; Kessels, Wilhelmus M M; Bol, Ageeth A; Bent, Stacey F; Mackus, Adriaan J M.

Afiliação

Singh JA; Department of Chemistry, Stanford University, 333 Campus Drive, Stanford, California 94305, United States.
Thissen NFW; Department of Applied Physics, Eindhoven University of Technology, P.O. Box 513, 5600 MB Eindhoven, Netherlands.
Kim WH; Division of Advanced Materials Engineering, Chonbuk National University, 567 Baekje-daero, deokjin-gu, Jeonju-si, Jeollabuk-do, 54896, Republic of Korea.
Johnson H; Department of Chemical Engineering, Stanford University, 443 Via Ortega, Stanford, California 94305, United States.
Kessels WMM; Advanced Technology 1, Toyota Motor Europe NV/SA, Hoge Wei 33A, B-1930 Zaventem, Belgium.
Bol AA; Department of Applied Physics, Eindhoven University of Technology, P.O. Box 513, 5600 MB Eindhoven, Netherlands.
Bent SF; Department of Applied Physics, Eindhoven University of Technology, P.O. Box 513, 5600 MB Eindhoven, Netherlands.
Mackus AJM; Department of Chemical Engineering, Stanford University, 443 Via Ortega, Stanford, California 94305, United States.

Chem Mater ; 30(3): 663-670, 2018 Feb 13.

Article em En | MEDLINE | ID: mdl-29503508

Texto completo

Imprimir

XML

PubMed Links

Buscar no Google

Texto completo: 1 Base de dados: MEDLINE Idioma: En Revista: Chem Mater Ano de publicação: 2018 Tipo de documento: Article País de afiliação: Estados Unidos

Texto completo

Imprimir

XML

PubMed Links

Buscar no Google

Texto completo: 1 Base de dados: MEDLINE Idioma: En Revista: Chem Mater Ano de publicação: 2018 Tipo de documento: Article País de afiliação: Estados Unidos