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Two-Terminal and Multi-Terminal Designs for Next-Generation Quantized Hall Resistance Standards: Contact Material and Geometry.
Kruskopf, Mattias; Rigosi, Albert F; Panna, Alireza R; Patel, Dinesh K; Jin, Hanbyul; Marzano, Martina; Berilla, Michael; Newell, David B; Elmquist, Randolph E.
Afiliação
  • Kruskopf M; Department of Physics, Joint Quantum Institute, University of Maryland, College Park, MD 20742 USA.
  • Rigosi AF; National Institute of Standards and Technology, Gaithersburg, MD 20899 USA.
  • Panna AR; National Institute of Standards and Technology, Gaithersburg, MD 20899 USA.
  • Patel DK; Graduate Institute of Applied Physics, National Taiwan University, Taipei 10617, Taiwan.
  • Jin H; Department of Physics, Joint Quantum Institute, University of Maryland, College Park, MD 20742 USA.
  • Marzano M; Politecnico di Turin, Istituto Nazionale di Ricerca Metrologica, 10135 Turin, Italy.
  • Berilla M; National Institute of Standards and Technology, Gaithersburg, MD 20899 USA.
  • Newell DB; National Institute of Standards and Technology, Gaithersburg, MD 20899 USA.
  • Elmquist RE; National Institute of Standards and Technology, Gaithersburg, MD 20899 USA.
IEEE Trans Electron Devices ; 66(9)2019.
Article em En | MEDLINE | ID: mdl-32116346
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Texto completo: 1 Base de dados: MEDLINE Idioma: En Revista: IEEE Trans Electron Devices Ano de publicação: 2019 Tipo de documento: Article
Texto completo
Imprimir
XML
PubMed Links
Buscar no Google

Texto completo: 1 Base de dados: MEDLINE Idioma: En Revista: IEEE Trans Electron Devices Ano de publicação: 2019 Tipo de documento: Article