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Additive Manufacturing of High-Refractive-Index, Nanoarchitected Titanium Dioxide for 3D Dielectric Photonic Crystals.
Vyatskikh, Andrey; Ng, Ryan C; Edwards, Bryce; Briggs, Ryan M; Greer, Julia R.
Afiliação
  • Vyatskikh A; Division of Engineering and Applied Science, California Institute of Technology, 1200 East California Boulevard, Pasadena, California 91125, United States.
  • Ng RC; Division of Chemistry and Chemical Engineering, California Institute of Technology, 1200 East California Boulevard, Pasadena, California 91125, United States.
  • Edwards B; Division of Engineering and Applied Science, California Institute of Technology, 1200 East California Boulevard, Pasadena, California 91125, United States.
  • Briggs RM; Jet Propulsion Laboratory, California Institute of Technology, 4800 Oak Grove Drive, Pasadena, California 91109, United States.
  • Greer JR; Division of Engineering and Applied Science, California Institute of Technology, 1200 East California Boulevard, Pasadena, California 91125, United States.
Nano Lett ; 20(5): 3513-3520, 2020 May 13.
Article em En | MEDLINE | ID: mdl-32338926
Additive manufacturing at small scales enables advances in micro- and nanoelectromechanical systems, micro-optics, and medical devices. Materials that lend themselves to AM at the nanoscale, especially for optical applications, are limited. State-of-the-art AM processes for high-refractive-index materials typically suffer from high porosity and poor repeatability and require complex experimental procedures. We developed an AM process to fabricate complex 3D architectures out of fully dense titanium dioxide (TiO2) with a refractive index of 2.3 and nanosized critical dimensions. Transmission electron microscopy (TEM) analysis proves this material to be rutile phase of nanocrystalline TiO2, with an average grain size of 110 nm and <1% porosity. Proof-of-concept woodpile architectures with 300-600 nm beam dimensions exhibit a full photonic band gap centered at 1.8-2.9 µm, as revealed by Fourier-transform infrared spectroscopy (FTIR) and supported by plane wave expansion simulations. The developed AM process enables advances in 3D MEMS, micro-optics, and prototyping of 3D dielectric PhCs.
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Texto completo: 1 Base de dados: MEDLINE Idioma: En Revista: Nano Lett Ano de publicação: 2020 Tipo de documento: Article País de afiliação: Estados Unidos

Texto completo: 1 Base de dados: MEDLINE Idioma: En Revista: Nano Lett Ano de publicação: 2020 Tipo de documento: Article País de afiliação: Estados Unidos