High-energy ion (He+, Si++, Ga+, Au++) interactions with PMMA in ion beam lithography.

Zhang, Lei; Thomas, Joseph P; Guan, Xiaoyi; Heinig, Nina F; Leung, Kam Tong

High-energy ion (He⁺, Si⁺⁺, Ga⁺, Au⁺⁺) interactions with PMMA in ion beam lithography.

Zhang, Lei; Thomas, Joseph P; Guan, Xiaoyi; Heinig, Nina F; Leung, Kam Tong.

Afiliação

Zhang L; WATLab, and Department of Chemistry, University of Waterloo, Waterloo, Ontario N2L 3G1, Canada.
Thomas JP; WATLab, and Department of Chemistry, University of Waterloo, Waterloo, Ontario N2L 3G1, Canada.
Guan X; WATLab, and Department of Chemistry, University of Waterloo, Waterloo, Ontario N2L 3G1, Canada.
Heinig NF; WATLab, and Department of Chemistry, University of Waterloo, Waterloo, Ontario N2L 3G1, Canada.
Leung KT; WATLab, and Department of Chemistry, University of Waterloo, Waterloo, Ontario N2L 3G1, Canada.

Nanotechnology ; 31(32): 325301, 2020 Aug 07.

Article em En | MEDLINE | ID: mdl-32340004

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Texto completo: 1 Base de dados: MEDLINE Idioma: En Revista: Nanotechnology Ano de publicação: 2020 Tipo de documento: Article País de afiliação: Canadá

Texto completo

Imprimir

XML

PubMed Links

Buscar no Google

Texto completo: 1 Base de dados: MEDLINE Idioma: En Revista: Nanotechnology Ano de publicação: 2020 Tipo de documento: Article País de afiliação: Canadá