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An all two-dimensional vertical heterostructure graphene/CuInP2S6/MoS2for negative capacitance field effect transistor.
Liaqat, Adeel; Yin, Yiheng; Hussain, Sabir; Wen, Wen; Wu, Juanxia; Guo, Yuzheng; Dang, Chunhe; Ho, Ching-Hwa; Liu, Zheng; Yu, Peng; Cheng, Zhihai; Xie, Liming.
Afiliação
  • Liaqat A; CAS Key Laboratory of Standardization and Measurement for Nanotechnology, National Center for Nanoscience and Technology, Beijing 100190, People's Republic of China.
  • Yin Y; University of Chinese Academy of Sciences, Beijing 100049, People's Republic of China.
  • Hussain S; School of Electrical Engineering and Automation, Wuhan University, Wuhan 430072, People's Republic of China.
  • Wen W; CAS Key Laboratory of Standardization and Measurement for Nanotechnology, National Center for Nanoscience and Technology, Beijing 100190, People's Republic of China.
  • Wu J; University of Chinese Academy of Sciences, Beijing 100049, People's Republic of China.
  • Guo Y; CAS Key Laboratory of Standardization and Measurement for Nanotechnology, National Center for Nanoscience and Technology, Beijing 100190, People's Republic of China.
  • Dang C; University of Chinese Academy of Sciences, Beijing 100049, People's Republic of China.
  • Ho CH; CAS Key Laboratory of Standardization and Measurement for Nanotechnology, National Center for Nanoscience and Technology, Beijing 100190, People's Republic of China.
  • Liu Z; School of Electrical Engineering and Automation, Wuhan University, Wuhan 430072, People's Republic of China.
  • Yu P; CAS Key Laboratory of Standardization and Measurement for Nanotechnology, National Center for Nanoscience and Technology, Beijing 100190, People's Republic of China.
  • Cheng Z; University of Chinese Academy of Sciences, Beijing 100049, People's Republic of China.
  • Xie L; Graduate Institute of Applied Science and Technology, National Taiwan University of Science and Technology, Taipei 106, Taiwan, Republic of China.
Nanotechnology ; 33(12)2021 Dec 24.
Article em En | MEDLINE | ID: mdl-34874305
ABSTRACT
As scaling down the size of metal oxide semiconductor field-effect transistors (FETs), power dissipation has become a major challenge. Lowering down the sub-threshold swing (SS) is known as an effective technique to decrease the operating voltage of FETs and hence lower down the power consumption. However, the Boltzmann distribution of electrons (so-called 'Boltzmann tyranny') implements a physical limit to the SS value. Use of negative capacitance (NC) effect has enabled a new path to achieve a low SS below the Boltzmann limit (60 mV dec-1at room temperature). In this work, we have demonstrated a NC-FET from an all two-dimensional (2D) metal ferroelectric semiconductor (MFS) vertical heterostructure Graphene/CuInP2S6/MoS2. The negative capacitance from the ferroelectric CuInP2S6has enabled the breaking of the 'Boltzmann tyranny'. The heterostructure based device has shown steep slopes switching below 60 mV dec-1(lowest to < 10 mV dec-1) over 3 orders of source-drain current, which provides an avenue for all 2D material based steep slope FETs.
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Texto completo: 1 Base de dados: MEDLINE Idioma: En Revista: Nanotechnology Ano de publicação: 2021 Tipo de documento: Article

Texto completo: 1 Base de dados: MEDLINE Idioma: En Revista: Nanotechnology Ano de publicação: 2021 Tipo de documento: Article