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Simulation Study of the Use of AlGaN/GaN Ultra-Thin-Barrier HEMTs with Hybrid Gates for Achieving a Wide Threshold Voltage Modulation Range.
Wang, Shouyi; Zhou, Qi; Chen, Kuangli; Bai, Pengxiang; Wang, Jinghai; Zhu, Liyang; Zhou, Chunhua; Gao, Wei; Zhang, Bo.
Afiliação
  • Wang S; State Key Laboratory of Electronic Thin Film and Integrated Devices, School of Electronic Science and Engineering, University of Electronic Science and Technology of China (UESTC), Chengdu 610054, China.
  • Zhou Q; State Key Laboratory of Electronic Thin Film and Integrated Devices, School of Electronic Science and Engineering, University of Electronic Science and Technology of China (UESTC), Chengdu 610054, China.
  • Chen K; The Institute of Electronic and Information Engineering of UESTC in Guangdong, Dongguan 523808, China.
  • Bai P; State Key Laboratory of Electronic Thin Film and Integrated Devices, School of Electronic Science and Engineering, University of Electronic Science and Technology of China (UESTC), Chengdu 610054, China.
  • Wang J; State Key Laboratory of Electronic Thin Film and Integrated Devices, School of Electronic Science and Engineering, University of Electronic Science and Technology of China (UESTC), Chengdu 610054, China.
  • Zhu L; State Key Laboratory of Electronic Thin Film and Integrated Devices, School of Electronic Science and Engineering, University of Electronic Science and Technology of China (UESTC), Chengdu 610054, China.
  • Zhou C; State Key Laboratory of Electronic Thin Film and Integrated Devices, School of Electronic Science and Engineering, University of Electronic Science and Technology of China (UESTC), Chengdu 610054, China.
  • Gao W; State Key Laboratory of Electronic Thin Film and Integrated Devices, School of Electronic Science and Engineering, University of Electronic Science and Technology of China (UESTC), Chengdu 610054, China.
  • Zhang B; State Key Laboratory of Electronic Thin Film and Integrated Devices, School of Electronic Science and Engineering, University of Electronic Science and Technology of China (UESTC), Chengdu 610054, China.
Materials (Basel) ; 15(2)2022 Jan 15.
Article em En | MEDLINE | ID: mdl-35057371
ABSTRACT
In this work, novel hybrid gate Ultra-Thin-Barrier HEMTs (HG-UTB HEMTs) featuring a wide modulation range of threshold voltages (VTH) are proposed. The hybrid gate structure consists of a p-GaN gate part and a MIS-gate part. Due to the depletion effect assisted by the p-GaN gate part, the VTH of HG-UTB HEMTs can be significantly increased. By tailoring the hole concentration of the p-GaN gate, the VTH can be flexibly modulated from 1.63 V to 3.84 V. Moreover, the MIS-gate part enables the effective reduction in the electric field (E-field) peak at the drain-side edge of the p-GaN gate, which reduces the potential gate degradation originating from the high E-field in the p-GaN gate. Meanwhile, the HG-UTB HEMTs exhibit a maximum drain current as high as 701 mA/mm and correspond to an on-resistance of 10.1 Ω mm and a breakdown voltage of 610 V. The proposed HG-UTB HEMTs are a potential means to achieve normally off GaN HEMTs with a promising device performance and featuring a flexible VTH modulation range, which is of great interest for versatile power applications.
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Texto completo: 1 Base de dados: MEDLINE Idioma: En Revista: Materials (Basel) Ano de publicação: 2022 Tipo de documento: Article País de afiliação: China

Texto completo: 1 Base de dados: MEDLINE Idioma: En Revista: Materials (Basel) Ano de publicação: 2022 Tipo de documento: Article País de afiliação: China