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A synchrotron-based kilowatt-level radiation source for EUV lithography.
Jiang, Bocheng; Feng, Chao; Li, Changliang; Bai, Zhenghe; Wan, Weishi; Xiang, Dao; Gu, Qiang; Wang, Kun; Zhang, Qinglei; Huang, Dazhang; Chen, Senyu.
Afiliação
  • Jiang B; Shanghai Advanced Research Institute, Chinese Academy of Sciences, Shanghai, 201204, China.
  • Feng C; Shanghai Institute of Applied Physics, Chinese Academy of Sciences, Shanghai, 201800, China.
  • Li C; Shanghai Advanced Research Institute, Chinese Academy of Sciences, Shanghai, 201204, China. fengchao@zjlab.org.cn.
  • Bai Z; Shanghai Institute of Applied Physics, Chinese Academy of Sciences, Shanghai, 201800, China. fengchao@zjlab.org.cn.
  • Wan W; Shanghai Advanced Research Institute, Chinese Academy of Sciences, Shanghai, 201204, China.
  • Xiang D; National Synchrotron Radiation Laboratory, USTC, Hefei, 230029, China.
  • Gu Q; School of Physical Science and Technology, ShanghaiTech University, Shanghai, 201210, China.
  • Wang K; Key Laboratory for Laser Plasmas (Ministry of Education), School of Physics and Astronomy, Shanghai Jiao Tong University, Shanghai, 200240, China.
  • Zhang Q; Shanghai Advanced Research Institute, Chinese Academy of Sciences, Shanghai, 201204, China.
  • Huang D; Shanghai Institute of Applied Physics, Chinese Academy of Sciences, Shanghai, 201800, China.
  • Chen S; Shanghai Advanced Research Institute, Chinese Academy of Sciences, Shanghai, 201204, China.
Sci Rep ; 12(1): 3325, 2022 Feb 28.
Article em En | MEDLINE | ID: mdl-35228673
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Texto completo: 1 Base de dados: MEDLINE Idioma: En Revista: Sci Rep Ano de publicação: 2022 Tipo de documento: Article País de afiliação: China
Texto completo
Imprimir
XML
PubMed Links
Buscar no Google

Texto completo: 1 Base de dados: MEDLINE Idioma: En Revista: Sci Rep Ano de publicação: 2022 Tipo de documento: Article País de afiliação: China