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AC-assisted deposition of aggregate free silica films with vertical pore structure.
Moehl, Gilles E; Nasir, Tauqir; Han, Yisong; Noori, Yasir J; Huang, Ruomeng; Beanland, Richard; Bartlett, Philip N; Hector, Andrew L.
Afiliação
  • Moehl GE; School of Chemistry, University of Southampton, SO17 1BJ, UK. A.L.Hector@soton.ac.uk.
  • Nasir T; School of Chemistry, University of Southampton, SO17 1BJ, UK. A.L.Hector@soton.ac.uk.
  • Han Y; Department of Physics, University of Warwick, CV4 7AL, UK.
  • Noori YJ; School of Electronics and Computer Science, University of Southampton, SO17 1BJ, UK.
  • Huang R; School of Electronics and Computer Science, University of Southampton, SO17 1BJ, UK.
  • Beanland R; Department of Physics, University of Warwick, CV4 7AL, UK.
  • Bartlett PN; School of Chemistry, University of Southampton, SO17 1BJ, UK. A.L.Hector@soton.ac.uk.
  • Hector AL; School of Chemistry, University of Southampton, SO17 1BJ, UK. A.L.Hector@soton.ac.uk.
Nanoscale ; 14(14): 5404-5411, 2022 Apr 07.
Article em En | MEDLINE | ID: mdl-35320330
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Texto completo: 1 Base de dados: MEDLINE Idioma: En Revista: Nanoscale Ano de publicação: 2022 Tipo de documento: Article País de afiliação: Reino Unido
Texto completo
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XML
PubMed Links
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Texto completo: 1 Base de dados: MEDLINE Idioma: En Revista: Nanoscale Ano de publicação: 2022 Tipo de documento: Article País de afiliação: Reino Unido