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Recent Advances In Silicon Carbide Chemical Mechanical Polishing Technologies.
Hsieh, Chi-Hsiang; Chang, Che-Yuan; Hsiao, Yi-Kai; Chen, Chao-Chang A; Tu, Chang-Ching; Kuo, Hao-Chung.
Afiliação
  • Hsieh CH; Department of Photonics, Institute of Electro-Optical Engineering, National Yang Ming Chiao Tung University, Hsinchu 30010, Taiwan.
  • Chang CY; Institute of Pioneer Semiconductor Innovation, Industry Academia Innovation School, National Yang Ming Chiao Tung University, Hsinchu 30010, Taiwan.
  • Hsiao YK; Semiconductor Research Center, Hon Hai Research Institute, Taipei 11492, Taiwan.
  • Chen CA; Department of Mechanical Engineering, National Taiwan University of Science and Technology, Taipei 10607, Taiwan.
  • Tu CC; Semiconductor Research Center, Hon Hai Research Institute, Taipei 11492, Taiwan.
  • Kuo HC; Department of Photonics, Institute of Electro-Optical Engineering, National Yang Ming Chiao Tung University, Hsinchu 30010, Taiwan.
Micromachines (Basel) ; 13(10)2022 Oct 16.
Article em En | MEDLINE | ID: mdl-36296105
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Texto completo: 1 Base de dados: MEDLINE Idioma: En Revista: Micromachines (Basel) Ano de publicação: 2022 Tipo de documento: Article País de afiliação: Taiwan
Texto completo
Imprimir
XML
PubMed Links
Buscar no Google

Texto completo: 1 Base de dados: MEDLINE Idioma: En Revista: Micromachines (Basel) Ano de publicação: 2022 Tipo de documento: Article País de afiliação: Taiwan