Reactivity of Silylene with Gallium- and Boron Trihalide at Reductive Conditions Resulting in Unforeseen Products.

Nazish, Mohd; Harinath, Adimulam; Lüert, Daniel; Köhler, Christian; Herbst-Irmer, Regine; Stalke, Dietmar; Roesky, Herbert W

Nazish, Mohd; Harinath, Adimulam; Lüert, Daniel; Köhler, Christian; Herbst-Irmer, Regine; Stalke, Dietmar; Roesky, Herbert W.

Afiliação

Nazish M; Institut für Anorganische Chemie, Universität Göttingen, Tammannstraße 4, 37077, Göttingen, Germany.
Harinath A; Institut für Anorganische Chemie, Universität Göttingen, Tammannstraße 4, 37077, Göttingen, Germany.
Lüert D; Department of Science & Humanities, MLR Institute of Technology, Hyderabad.
Köhler C; Institut für Anorganische Chemie, Universität Göttingen, Tammannstraße 4, 37077, Göttingen, Germany.
Herbst-Irmer R; Institut für Anorganische Chemie, Universität Göttingen, Tammannstraße 4, 37077, Göttingen, Germany.
Stalke D; Institut für Anorganische Chemie, Universität Göttingen, Tammannstraße 4, 37077, Göttingen, Germany.
Roesky HW; Institut für Anorganische Chemie, Universität Göttingen, Tammannstraße 4, 37077, Göttingen, Germany.

Chemistry ; 29(29): e202300310, 2023 May 22.

Article em En | MEDLINE | ID: mdl-36848490

Palavras-chave

boron; gallium; insertion; silylene; stabilization

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Texto completo: 1 Base de dados: MEDLINE Idioma: En Revista: Chemistry Assunto da revista: QUIMICA Ano de publicação: 2023 Tipo de documento: Article País de afiliação: Alemanha

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