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Boosting the photoelectrochemical performance of bismuth vanadate photoanode through homojunction construction.
Wang, Haipeng; Wang, Shuyun; Oo, May Thawda; Yang, Yuewen; Zhou, Jiasheng; Huang, Miaoyan; Zhang, Rui-Qin.
Afiliação
  • Wang H; Department of Physics, City University of Hong Kong, 999077, Hong Kong Special Administrative Region.
  • Wang S; Department of Material and Science Engineering, City University of Hong Kong, 999077, Hong Kong Special Administrative Region.
  • Oo MT; Department of Physics, City University of Hong Kong, 999077, Hong Kong Special Administrative Region.
  • Yang Y; Department of Physics, City University of Hong Kong, 999077, Hong Kong Special Administrative Region.
  • Zhou J; Department of Physics, City University of Hong Kong, 999077, Hong Kong Special Administrative Region.
  • Huang M; Shenzhen JL Computational Science and Applied Research Institute, Shenzhen 518000, China. Electronic address: mariehuang@csar.ac.cn.
  • Zhang RQ; Department of Physics, City University of Hong Kong, 999077, Hong Kong Special Administrative Region; Shenzhen JL Computational Science and Applied Research Institute, Shenzhen 518000, China. Electronic address: aprqz@cityu.edu.hk.
J Colloid Interface Sci ; 646: 687-694, 2023 Sep 15.
Article em En | MEDLINE | ID: mdl-37229986
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Texto completo: 1 Base de dados: MEDLINE Idioma: En Revista: J Colloid Interface Sci Ano de publicação: 2023 Tipo de documento: Article
Texto completo
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PubMed Links
Buscar no Google

Texto completo: 1 Base de dados: MEDLINE Idioma: En Revista: J Colloid Interface Sci Ano de publicação: 2023 Tipo de documento: Article