Your browser doesn't support javascript.
loading
Memristive switching in the surface of a charge-density-wave topological semimetal.
Ma, Jianwen; Meng, Xianghao; Zhang, Binhua; Wang, Yuxiang; Mou, Yicheng; Lin, Wenting; Dai, Yannan; Chen, Luqiu; Wang, Haonan; Wu, Haoqi; Gu, Jiaming; Wang, Jiayu; Du, Yuhan; Liu, Chunsen; Shi, Wu; Yang, Zhenzhong; Tian, Bobo; Miao, Lin; Zhou, Peng; Duan, Chun-Gang; Xu, Changsong; Yuan, Xiang; Zhang, Cheng.
Afiliação
  • Ma J; State Key Laboratory of Surface Physics and Institute for Nanoelectronic Devices and Quantum Computing, Fudan University, Shanghai 200433, China.
  • Meng X; State Key Laboratory of Precision Spectroscopy, East China Normal University, Shanghai 200241, China.
  • Zhang B; Key Laboratory of Computational Physical Sciences (Ministry of Education), Institute of Computational Physical Sciences, State Key Laboratory of Surface Physics, Department of Physics, Fudan University, Shanghai 200433, China; Shanghai Qi Zhi Institute, Shanghai 200030, China.
  • Wang Y; State Key Laboratory of Surface Physics and Institute for Nanoelectronic Devices and Quantum Computing, Fudan University, Shanghai 200433, China.
  • Mou Y; State Key Laboratory of Surface Physics and Institute for Nanoelectronic Devices and Quantum Computing, Fudan University, Shanghai 200433, China.
  • Lin W; School of Physics, Southeast University, Nanjing 211189, China.
  • Dai Y; Key Laboratory of Polar Materials and Devices (Ministry of Education), Department of Electronics, East China Normal University, Shanghai 200241, China; Shanghai Center of Brain-inspired Intelligent Materials and Devices, East China Normal University, Shanghai 200241, China.
  • Chen L; Key Laboratory of Polar Materials and Devices (Ministry of Education), Department of Electronics, East China Normal University, Shanghai 200241, China; Shanghai Center of Brain-inspired Intelligent Materials and Devices, East China Normal University, Shanghai 200241, China.
  • Wang H; Key Laboratory of Polar Materials and Devices (Ministry of Education), Department of Electronics, East China Normal University, Shanghai 200241, China.
  • Wu H; State Key Laboratory of ASIC and System, School of Microelectronics, Fudan University, Shanghai 200433, China.
  • Gu J; State Key Laboratory of Surface Physics and Institute for Nanoelectronic Devices and Quantum Computing, Fudan University, Shanghai 200433, China.
  • Wang J; State Key Laboratory of Surface Physics and Institute for Nanoelectronic Devices and Quantum Computing, Fudan University, Shanghai 200433, China.
  • Du Y; State Key Laboratory of Precision Spectroscopy, East China Normal University, Shanghai 200241, China.
  • Liu C; Frontier Institute of Chip and System, Fudan University, Shanghai 200433, China.
  • Shi W; State Key Laboratory of Surface Physics and Institute for Nanoelectronic Devices and Quantum Computing, Fudan University, Shanghai 200433, China; Zhangjiang Fudan International Innovation Center, Fudan University, Shanghai 201210, China.
  • Yang Z; Key Laboratory of Polar Materials and Devices (Ministry of Education), Department of Electronics, East China Normal University, Shanghai 200241, China.
  • Tian B; Key Laboratory of Polar Materials and Devices (Ministry of Education), Department of Electronics, East China Normal University, Shanghai 200241, China; Shanghai Center of Brain-inspired Intelligent Materials and Devices, East China Normal University, Shanghai 200241, China.
  • Miao L; School of Physics, Southeast University, Nanjing 211189, China.
  • Zhou P; State Key Laboratory of ASIC and System, School of Microelectronics, Fudan University, Shanghai 200433, China; Frontier Institute of Chip and System, Fudan University, Shanghai 200433, China.
  • Duan CG; Key Laboratory of Polar Materials and Devices (Ministry of Education), Department of Electronics, East China Normal University, Shanghai 200241, China; Shanghai Center of Brain-inspired Intelligent Materials and Devices, East China Normal University, Shanghai 200241, China.
  • Xu C; Key Laboratory of Computational Physical Sciences (Ministry of Education), Institute of Computational Physical Sciences, State Key Laboratory of Surface Physics, Department of Physics, Fudan University, Shanghai 200433, China; Shanghai Qi Zhi Institute, Shanghai 200030, China. Electronic address: cs
  • Yuan X; State Key Laboratory of Precision Spectroscopy, East China Normal University, Shanghai 200241, China; Shanghai Center of Brain-inspired Intelligent Materials and Devices, East China Normal University, Shanghai 200241, China; School of Physics and Electronic Science, East China Normal University, Sha
  • Zhang C; State Key Laboratory of Surface Physics and Institute for Nanoelectronic Devices and Quantum Computing, Fudan University, Shanghai 200433, China; Zhangjiang Fudan International Innovation Center, Fudan University, Shanghai 201210, China. Electronic address: zhangcheng@fudan.edu.cn.
Sci Bull (Beijing) ; 69(13): 2042-2049, 2024 Jul 15.
Article em En | MEDLINE | ID: mdl-38824120
ABSTRACT
Owing to the outstanding properties provided by nontrivial band topology, topological phases of matter are considered as a promising platform towards low-dissipation electronics, efficient spin-charge conversion, and topological quantum computation. Achieving ferroelectricity in topological materials enables the non-volatile control of the quantum states, which could greatly facilitate topological electronic research. However, ferroelectricity is generally incompatible with systems featuring metallicity due to the screening effect of free carriers. In this study, we report the observation of memristive switching based on the ferroelectric surface state of a topological semimetal (TaSe4)2I. We find that the surface state of (TaSe4)2I presents out-of-plane ferroelectric polarization due to surface reconstruction. With the combination of ferroelectric surface and charge-density-wave-gapped bulk states, an electric-switchable barrier height can be achieved in (TaSe4)2I-metal contact. By employing a multi-terminal-grounding design, we manage to construct a prototype ferroelectric memristor based on (TaSe4)2I with on/off ratio up to 103, endurance over 103 cycles, and good retention characteristics. The origin of the ferroelectric surface state is further investigated by first-principles calculations, which reveal an interplay between ferroelectricity and band topology. The emergence of ferroelectricity in (TaSe4)2I not only demonstrates it as a rare but essential case of ferroelectric topological materials, but also opens new routes towards the implementation of topological materials in functional electronic devices.
Palavras-chave

Texto completo: 1 Base de dados: MEDLINE Idioma: En Revista: Sci Bull (Beijing) Ano de publicação: 2024 Tipo de documento: Article País de afiliação: China

Texto completo: 1 Base de dados: MEDLINE Idioma: En Revista: Sci Bull (Beijing) Ano de publicação: 2024 Tipo de documento: Article País de afiliação: China