Patterned achromatic elliptical polarizer for short-wave infrared imaging polarimetry.

Short-wave infrared (SWIR) imaging polarimetry has widespread applications in telecommunication, medical imaging, surveillance, remote-sensing, and industrial metrology. In this work, we design, fabricate, and test an achromatic SWIR elliptical polarizer, which is a key component of SWIR imaging polarimetry. The elliptical polarizer is made of a patterned linear polarizer and a patterned optical elliptical retarder. The linear polarizer is a wire grid polarizer. The elliptical retarder is constructed with three layers of nematic phase A-plate liquid crystal polymer (LCP) films with different fast axis orientations and physical film thicknesses. For each LCP layer, four arrays of hexagonal patterns with individual fast-axis orientations are realized utilizing selective linearly polarized ultraviolet (UV) irradiation on a photo-alignment polymer film. The Mueller matrices of the optical filters were measured in the wavelength range 1000 nm to 1600 nm and compared with theory. Our results demonstrate the functionality and quality of the patterned retarders with normalized analyzer vector parameter deviation below 7% over this wavelength range. To the best of our knowledge, this work represents the first polymer-based patterned elliptical polarizer for SWIR polarimetry imaging applications.

Microfabrication of a color filter array utilizing colored SU-8 photoresists.

Patterned color filter arrays are important components in digital cameras, camcorders, scanners, and multispectral detection and imaging instruments. In addition to the rapid and continuous progress to improve camera resolution and the efficiency of imaging sensors, research into the design of color filter arrays is important to extend the imaging capability beyond conventional applications. This paper reports the use of colored SU-8 photoresists as a material to fabricate color filter arrays. Optical properties, fabrication parameters, and pattern spatial resolution are systematically studied for five color photoresists: violet, blue, green, yellow, and red. An end-to-end fabrication process is developed to realize a five-color filter array designed for a wide angle multiband artificial compound eye camera system for pentachromatic and polarization imaging. Colored SU-8 photoresists present notable advantages, including patternability, color tunability, low-temperature compatibility, and process simplicity. The results regarding the optical properties and the fabrication process for a colored SU-8 photoresist provide significant insight into its usage as an optical material to investigate nonconventional color filter designs.