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1.
Materials (Basel) ; 15(17)2022 Aug 26.
Artigo em Inglês | MEDLINE | ID: mdl-36079281

RESUMO

A systematic investigation of the changes in structural and optical properties of a semi-insulating GaAs (001) wafer under high-energy electron irradiation is presented in this study. GaAs wafers were exposed to high-energy electron beams under different energies of 10, 15, and 20 MeV for absorbed doses ranging from 0-2.0 MGy. The study showed high-energy electron bombardments caused roughening on the surface of the irradiated GaAs samples. At the maximum delivered energy of 20 MeV electrons, the observed root mean square (RMS) roughness increased from 5.993 (0.0 MGy) to 14.944 nm (2.0 MGy). The increased RMS roughness with radiation doses was consistent with an increased hole size of incident electrons on the GaAs surface from 0.015 (0.5 MGy) to 0.066 nm (2.0 MGy) at 20 MeV electrons. Interestingly, roughness on the surface of irradiated GaAs samples affected an increase in material wettability. The study also observed the changes in bandgap energy of GaAs samples after irradiation with 10, 15, and 20 MeV electrons. The band gap energy was found in the 1.364 to 1.397 eV range, and the observed intense UV-VIS spectra were higher than in non-irradiated samples. The results revealed an increase of light absorption in irradiated GaAs samples to be higher than in original-based samples.

2.
J Nanosci Nanotechnol ; 11(12): 10584-8, 2011 Dec.
Artigo em Inglês | MEDLINE | ID: mdl-22408953

RESUMO

Strained GaAsN T-junction quantum wires (T-QWRs) with different N contents grown on GaAs by two steps metal-organic vapor phase epitaxy in [001] and [110] directions, namely QW1 and QW2 respectively, have been investigated by photoreflectance (PR) spectroscopy. Two GaAsN T-QWRs with different N contents were formed by T-intersection of (i) a 6.4-nm-thick GaAs0.89N0.011 QW1 and a 5.2-nm-thick GaAs0.968N0.032 QW2 and (ii) a 5.0-nm-thick GaAs0.985N0.015 QW1 and a 5.2-nm-thick GaAs0.968N0.032 QW2. An evidence of a one-dimensional structure at T-intersection of the two QWs on the (001) and (110) surfaces was established by PR resonances associated with extended states in all the QW and T-QWR samples. It is found that larger lateral confinement energy than 100 meV in both of [001] and [110] directions were achieved for GaAsN T-QWRs. With increasing temperature, the transition energy of GaAsN T-QWRs decreases with a faster shrinking rate compared to that of bulk GaAs. Optical quality of GaAsN T-QWRs is found to be affected by the N-induced band edge fluctuation, which is the unique characteristic of dilute III-V-nitrides.

3.
J Nanosci Nanotechnol ; 10(11): 7154-7, 2010 Nov.
Artigo em Inglês | MEDLINE | ID: mdl-21137886

RESUMO

Nearly lattice-matched In(0.528)Ga(0.472)P(1-y)Ny bulk layer and In(0.528)Ga(0.472)P(1-y)Ny/GaAs and GaAs/ In(0.528)Ga(0.472)P(1-y)Ny quantum wells with higher N content, y = 0.027, were grown on GaAs(001) substrates by metalorganic vapor phase epitaxy. High-resolution X-ray diffraction results demonstrated the high quality of both the layer and quantum wells with fairly flat interfaces. Temperature dependent photoluminescence results showed that a near-band-edge emission is dominant in the bulk In(0.528)Ga(0.472)P(0.973)N(0.027) layer, which at low temperature (T < 100 K) is associated with localized emissions centered at approximately 1.73 eV. Bandgap of In(0.528)Ga(0.472)P(0.973)N(0.027) was examined to be 1.81 and 1.78 eV at 10 K and room-temperature, respectively. Low temperature (10 K)-photoluminescence spectrum obtained from the GaAs/InxGa(1-x)P(1-y)Ny quantum well also exhibited red emission at 1.73 eV attributed to the emission from the InGaPN barrier. In addition, there are the extra weak peaks appear in a near-infrared energy range at 1.357 and 1.351 eV for InxGa(1-x)P(1-y)Ny/GaAs and GaAs/InxGa(1-x)P(1-y)Ny quantum wells, respectively. Such optical transitions are considered as an indirect transition between electrons located in the InGaPN and holes located in the GaAs regions. This situation suggested that both the In(0.528)Ga(0.472)P(0.973)N(0.027)/GaAs and GaAs/In(0.528)Ga(0.472)P(0.973)N(0.027) quantum wells exhibits a type-II quantum structure. This interpretation is justified when the valence and conduction band offsets of the type-II band alignment, which are relatively approximated to be 450 and 160 meV, are properly taken into account.

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