RESUMO
Waveguiding across the visible spectrum in an unmodified bulk CMOS chip is reported. The chip is fabricated in a standard CMOS process, and a simple wet etch removes metal in predetermined locations to expose glass rib waveguides. A modified Euler bend is introduced to improve bend radii by nearly an order of magnitude in the rib waveguides, and upper-bound losses are measured at visible wavelengths. These losses range from 6.2 dB/cm at 450 nm to 3.2 dB/cm at 650 nm and represent the lowest losses reported at visible wavelengths in unmodified bulk CMOS.
RESUMO
Long range mass transport driven by an electric field has many applications in the fields of nanoscience and technology. Liquid-phase mass transport ranging from the micrometer to the millimeter scale and its application to nanopatterning have been demonstrated on chromium (Cr) thin films using a DC electric field. Under the influence of an electric field, the metal seems to undergo a chemical reaction, and the resulting liquid material flows out radially in all directions. In this study, we have explored the effect of an alternating (AC) electric field on this kind of liquid-phase material transport. Within the scope of this work, mass transport has been studied on Cr films 30 nm thick using an alternating square waveform with frequencies ranging from 100 Hz to 1000 Hz in steps of 50 Hz. The dependence of the material's formation, flow distance, and flow velocity on frequency, for a constant applied root mean square (RMS) voltage, was studied in detail. An analytical model is presented to explain the experimental results. This study, in particular the frequency parameter and the intermittent nature of the applied bias, will help us get a better control over the mass flow process, will lead to better resolutions for the electrolithography process.