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Metalenses have been widely investigated for their features of high design freedom. For practical applications, it is necessary to maximize the efficiency of the metalens. However, it is a great challenge to realize both a high numerical aperture (NA) and high-efficiency metalens in the community. Here, we introduce a method to design a hybrid metalens with a large numerical aperture and high focusing efficiency at terahertz frequency. The hybrid metalens consists of gradient metasurfaces in the central area and metagrating in the peripheral area to achieve high-efficiency beam focusing. To verify this concept, a hybrid metalens with a numerical aperture of 0.95 was designed at λ = 118.8â µm. The simulation results demonstrate that the focusing efficiency of the hybrid metalens is 65.8%. The experimental results show that the designed metalens is able to increase the focusing efficiency from 22.8% to 41.7%. The full widths at half maxima (FWHMs) of the focused spots of the hybrid metalens in the x direction and y direction are 0.72λ and 0.45λ, respectively. The proposed high-efficiency hybrid metalens has promising application prospects in various applications of a complex optical system.
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Near-field lithography has evident advantages in fabricating super-resolution nano-patterns. However, the working distance (WD) is limited due to the exponential decay characteristic of the evanescent waves. Here, we proposed a novel photolithography method based on a modified photonic crystal (PC), where a defect layer is embedded into the all-dielectric multilayer structure. It is shown that this design can amend the photonic band gap and enhance the desired high-kwaves dramatically, then the WD in air conditions could be extended greatly, which would drastically relax the engineering challenges for introducing the near-field lithography into real-world manufacturing applications. Typically, deep subwavelength patterns with a half-pitch of 32 nm (i.e.,λ/6) could be formed in photoresist layer at an air WD of 100 nm. Moreover, it is revealed that diversified two-dimensional patterns could be produced with a single exposure using linear polarized light. The analyses indicate that this improved dielectric PC is applicable for near-field lithography to produce super-resolution periodic patterns with large WD, strong field intensity, and great uniformity.
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Optical superoscillation, a phenomenon that the local optical field can oscillate much faster than that allowed by its highest harmonic, can significantly overcome the Abbe diffraction limit. However, as the spot size is compressed below the superoscillation criteria of 0.38λ/NA, huge sidebands will inevitably appear around the central lobe with intensity hundreds of times higher than that of the central lobe. Here, we propose an approach to realize superoscillation by using destructive interference. The central lobe size can be compressed beyond the superoscillation criteria without formation of strong sidebands by destructive interference between focused fields. Such a super-resolution metalens can find its application in label-free far-field super-resolution microscopy.
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Plasmonic lithography can utilize evanescent waves to produce subdiffraction patterns. However, the high loss and shallow depth of patterns severely obstruct its application in practice. In this work, a large focal depth is achieved for deep subwavelength lithography. It is accomplished by employing radially polarized light to excite surface plasmons on a concentric annular grating and combining designed epsilon-near-zero metamaterial to select a high spatial frequency mode, which can shape an evanescent Bessel beam in a photoresist (PR). Moreover, the intensity distribution of the subdiffraction beam can be further enhanced and uniformized by adding reflective layers. It is shown that a needle-like beam with a focal depth of over 500 nm (1.23λ) is formed in the PR layer, and the full width at half maximum of the beam is widened from only 80 nm (0.2λ) to 94 nm (0.23λ). The analyses indicate that this design is applicable for direct writing lithography to produce super-resolution patterns with small feature size, high aspect ratio, and strong field intensity.
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Although plasmonic photolithography can break through the diffraction limit and produce super-resolution patterns, the intrinsic high loss from metal severely obstructs its application in practice. Here we proposed a novel photolithography method based on a dielectric photonic crystal (PC) structure, where the nanofilms are analyzed systematically. It is shown that the PC can efficiently transmit the desired high-k waves, which is advantageous in generating deep subwavelength patterns and realizing super-resolution lithography. Typically, a PC composed of stacked nine films of a multilayer is demonstrated. The nanopatterns with a period of 60 nm are formed in the photoresist layer. Furthermore, this PC-based lithography system is tolerant to the surface roughness in a multilayer. The analyses indicate that this dielectric PC-based design is applicable for super-resolution lithography to produce periodic patterns with strong field intensity, high aspect ratios, and great uniformity.
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Independent manipulation of phase and polarization of optical fields is of great interest in various applications, including vector-field generation, optical tweezers, and nanolithography. The integration of phase and polarization manipulation on a single optical device may greatly simplify optical systems and eases optical alignment. In this Letter, a family of reflective cross-shaped quarter-wave birefringent metasurfaces is proposed to achieve full control of polarization and phase of reflected waves. Based on the proposed metasurfaces, two meta-mirrors are designed with integrated functions of polarization conversion and sub-diffraction focusing. Numerical investigations also reveal the achromatic focusing performance of the two meta-mirrors. The proposed metasurfaces with independent manipulation of polarization and phase provide flexible building blocks for constructing complicated vector optical fields.
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In order to realize the function of subdiffraction focusing using a single flat lens, a special metalens is proposed to modulate the circularly polarized light. Initially, the analyses indicate that the phase shift can cover [0,2π] by changing the rotation angle of a quadrangular-frustum pyramid-shaped structure from 0° to 180°, while the average amplitude transmittance can reach 96% at the wavelength of λ=1550 nm. Then, a flat metalens is designed by carefully arranging the quadrangular-frustum pyramid-shaped structures. The simulated results show that a focal spot could be obtained at the focal length of about f=2.87λ, and the focusing efficiency is â¼14.9%. Meanwhile, the full width at half maximum (FWHM) of the focusing spot is only 0.48λ, which is smaller than the diffraction limit. Furthermore, this designed metalens can function comparatively with a conventional lens in one-to-one imaging.
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Sub-diffraction quasi-non-diffracting beams with sub-wavelength transverse size are attractive for applications such as optical nano-manipulation, optical nano-fabrication, optical high-density storage, and optical super-resolution microscopy. In this paper, we proposed an optimization-free design approach and demonstrated the possibility of generating sub-diffraction quasi-non-diffracting beams with sub-wavelength size for different polarizations by a binary-phase Fresnel planar lens. More importantly, the optimization-free method significantly simplifies the design procedure and the generation of sub-diffracting quasi-non-diffracting beams. Utilizing the concept of normalized angular spectrum compression, for wavelength λ0 = 632.8 nm, a binary-phase Fresnel planar lens was designed and fabricated. The experimental results show that the sub-diffraction transverse size and the non-diffracting propagation distances are 0.40λ0-0.54λ0 and 90λ0, 0.43λ0-0.54λ0 and 73λ0, and 0.34λ0-0.41λ0 and 80λ0 for the generated quasi-non-diffracting beams with circular, longitudinal, and azimuthal polarizations, respectively.
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A three-dimensional (3D) hollow spot is of great interest for a wide variety of applications such as microscopy, lithography, data storage, optical manipulation, and optical manufacturing. Based on conventional high-numerical-aperture objective lenses, various methods have been proposed for the generation of 3D hollow spots for different polarizations. However, conventional optics are bulky, costly, and difficult to integrate. More importantly, they are diffraction-limited in nature. Owing to their unique properties of small size, light weight, and ease of integration, planar lenses have become attractive as components in the development of novel optical devices. Utilizing the concept of super-oscillation, planar lenses have already shown great potential in the generation of sub-diffraction, or even of super-oscillatory features, in propagating optical waves. In this paper, we propose a binary-phase planar lens with an ultra-long focal length (300λ) for the generation of a 3D hollow spot with a cylindrical vector wave. In addition, we experimentally demonstrate the formation of such a hollow spot with a sub-diffraction transverse size of 0.546λ (smaller than the diffraction limit of 0.5λ/NA, where NA denotes the lens numerical aperture) and a longitudinal size of 1.585λ. The ratio of central minimum intensity to the central ring peak intensity is less than 3.7%. Such a planar lens provides a promising way to achieve tight 3D optical confinement for different uses that might find applications in super-resolution microscopy, nano-lithography, high-density data storage, nano-particle optical manipulation, and nano-optical manufacturing.
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Terahertz wave imaging offers promising properties for non-destructive testing applications in the areas of homeland security, medicine, and industrial inspection. However, conventional optical lenses are heavy and bulky and difficult to integrate. An all-dielectric metasurface provides an attractive way to realize a planar lens of light weight that is ultrathin and offers ease of integration. Terahertz lenses based on various metasurfaces have been studied, especially for the application of wave focusing, while there are few experimental demonstrations of terahertz wave imaging lenses based on an all-dielectric metasurface. In the present work, we propose a metalens based on an all-dielectric metasurface with a sub-wavelength unit size of 0.39λ for terahertz wave imaging and experimentally demonstrate its performance in focusing and imaging. A large numerical aperture metalens was fabricated with a focal length of 300λ, radius of 300λ, and numerical aperture of 0.707. The experimental results show that the lens can focus THz waves with an incident angle up to 48°. More importantly, clear terahertz wave images of different objects were obtained for both different cases of forward- and inverse-incident directions, which demonstrate the reversibility of the metalens for imaging. Such a metalens provides a way for realization of all-planar-lens THz imaging system, and might find application in terahertz wave imaging, information processing, microscopy, and others.
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A focusing device is one of the key elements for terahertz applications, including homeland security, medicine, industrial inspection, and other fields. Sub-wavelength tight-focusing of terahertz waves is attractive for microscopy and spectroscopy. Flat optical lenses based on metasurfaces have shown potential in diffraction-limit focusing and advantages of ultrathin thickness and lightweight for large-aperture optics. However previously reported THz metalenses suffered from either polarization-dependency or small numerical aperture (NA), which greatly limits their focusing performance. In this paper, to achieve high-NA and polarization-free operation, we proposed a polarization-independent dielectric metasurface with a sub-wavelength period of 0.4λ. A planar terahertz lens based on such metasurface was designed for a wavelength of λ = 118.8 µm with a focal length of 100λ, a radius of 300λ, and a high NA of 0.95, which was fabricated with a silicon-on-insulator wafer. The experimental results demonstrate a tight focal spot with sub-wavelength full widths at half-maxima of 0.45λ and 0.61λ in the x and y directions, respectively, on the focal plane. In the x direction, the size of 0.45λ is even smaller than the diffraction limit 0.526λ (0.5λ/NA). Such a metalens is favorable for sub-wavelength tight-focusing terahertz waves with different polarizations, due to its polarization independence. The metalens has potential applications in THz imaging, spectroscopy, information processing, and communications, among others.
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The terahertz (THz) lens is an essential and strategic element of THz optical systems, while a conventional THz lens cannot even reach high resolution due to the diffraction limit. Optical super-oscillation paves a way to generate sub-diffraction hotspots in the far field, and demonstrates the capacity for resolution improvement of microscopic imaging in the visible range. However, there are few demonstrations of THz lenses for focusing hotspots or needles based on super-oscillation. We propose and experimentally demonstrate a far-field sub-diffraction focusing planar lens, consisting of a sub-wavelength concentric ring structure array, for a wavelength of 118.8 µm with focal length 420λ and radius 160λ. Utilizing the silicon-etching process, a sub-diffraction focusing lens is fabricated. The experimental results show that the planar lens can generate a sub-diffraction needle with length 19.7λ in the focal region along the optic axis. Moreover, the smallest focal spot, with a transverse size of 1.212λ, is smaller than the diffraction limit of 1.476λ. The proposed sub-diffraction optical needle planar lens can substitute for its traditional counterpart, and it has great potential in super-resolution tomography THz imaging systems.
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Due to its unique properties of nondiffracting propagation, highly-localized intensity distribution, small beam cross-section, and self-healing, a nondiffracting beam is attractive for materials processing, microscopy, and optical research. Various methods have been investigated to generate such beams with conventional optics. However, the transverse size of those nondiffracting beams is restricted by the diffraction-limit. To overcome the diffraction limit, we use the concepts of super-oscillation and the vectorial angular spectrum method to design a phase mask mirror with a focal length of 1 m, radius of 5 mm, and numerical aperture of about 0.005 for a wavelength of 632.8 nm. The phase mask mirror was created with a phase spatial light modulator. Under the illumination of a linearly polarized Gaussian wave, a nondiffracting beam was created with sub-diffraction transverse size. The maximum transverse size of the beam is smaller than the diffraction limit of 0.5λ/NA for a propagation distance greater than 43.3 mm. A nondiffracting beam with smaller transverse size can be realized by further increasing the NA value.
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Quasi-non-diffracting beams are attractive for various applications, including optical manipulation, super-resolution microscopes, and materials processing. However, it is a great challenge to design and generate super-long quasi-non-diffracting beams with sub-diffraction and sub-wavelength size. In this paper, a method based on the idea of compressing a normalized angular spectrum is developed, which makes it possible and provides a practical tool for the design of a quasi-non-diffracting beam with super-oscillatory sub-wavelength transverse size. It also presents a clear physical picture of the formation of super-oscillatory quasi-non-diffracting beams. Based on concepts of a local grating and super-oscillation, a lens was designed and fabricated for a working wavelength of λ = 632.8 nm. The validity of the idea of normalized angular spectrum compression was confirmed by both numerical investigations and experimental studies. An optical hollow needle with a length of more than 100λ was experimentally demonstrated, in which an optical hollow needle was observed with a sub-diffraction and sub-wavelength transverse size within a non-diffracting propagation distance of 94λ. Longer non-diffracting propagation distance is expected for a lens with larger radius and shorter effective wavelength.
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Planar lenses are attractive photonic devices due to its minimized size and easy to integrate. However, planar lenses designed in traditional ways are restricted by the diffraction limit. They have difficulties in further reducing the focal spot size beyond the diffraction limit. Super-oscillation provides a possible way to solve the problem. However, lenses based on super-oscillation have always been affected by huge sidelobes, which resulted in limited field of view and difficulties in real applications. To address the problem, in the paper, a far-field sub-diffraction lens based on binary amplitude-phase mask was demonstrated under illumination of linearly polarized plane wave at wavelength 632.8 nm. The lens realized a long focal length of 148λ (94 µm), and the full width at half maximum of the focal line was 0.406λ, which was super-oscillatory. More important is that such a flat lens has small sidelobes and wide field of view. Within the measured range of [-132λ, + 120λ], the maximum sidelobe observed on the focal plane was less than 22% of the central peak. Such binary amplitude-phase planar lens can also be extended to long focal length far-field sub-diffraction focusing lens for other spectrum ranges.
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In this paper, we numerically demonstrate the advantage of utilizing continuous amplitude and phase modulation in super-oscillation focusing lens design. Numerical results show that compared with simple binary amplitude modulation, continuous amplitude and phase modulation can greatly improve the super-oscillation focusing performance by increasing the central lobe intensity and the ratio of its energy to the total energy, reducing the sidelobe intensity, and substantially extending the field of view. Our study also reveals the role of phase distribution in reducing the spatial frequency bandwidth of the super-oscillation optical field on the focal plane. Based on continuous amplitude and binary phase modulation, a lens was designed with double layer metal slit array for wavelength of 4.6 µm. COMSOL is used to carry out the 2D simulation. The lens focal length is 40.18λ and the focal spot FWHM is 0.308λ. Two largest sidelobes are located right next to the central lobe with intensity about 40% of the central lobe intensity. Except for the two sidelobes, other sidelobes have intensity less than 25% of the central lobe intensity, which leads to a clear field of view on the whole focal plane.
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On account of the high dimension and band overlapping features of the ultraviolet spectrum of complex wastewater, the relevance vector machine (RVM) algorithm combined with contiguous ultraviolet spectrum technology was applied in nitrate modeling to realize the rapid and accurate prediction of nitrate-nitrogen. At first the algorithm principle of RVM was introduced, and then based on the ultraviolet spectra of collected pharmacy effluent samples, ultraviolet absorption data between 230 and 245 nm were selected for modeling. Multivariate linear regression, partial least squares, classical support vector machines (SVM) and RVM methods were applied in nitrate modeling respectively and model performances were compared. Experimental result indicates that RVM method has advantages of higher prediction accuracy, sparser model than other compared methods and faster operation speed than SVM method. The relative full-range error is less than 4.5% F. S. Finally, it can be concluded that the LS-SVM method is effective in rapid and accurate detection of nitrate in practical wastewater with complicated composition.
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Quantum cascade lasers (QCLs) are promising infrared coherent sources. Thanks to the quantum theory and band-gap engineering, QCL can access the wavelength in the range from 3 to 100 microm. Since the fingerprint spectrum of most gases are located in the mid-infrared range, mid-infrared quantum cascade laser based gas sensing technique has become the research focus world wide because of its high power, narrow linewidth and fast scanning. Recent progress in the QCL technology leads to a great improvement in laser output power and efficiency, which stimulates a fast development in the infrared laser spectroscopy. The present paper gives a broad review on the QCL based spectroscopy techniques according to their working principles. A discussion on their applications in gas sensing and explosive detecting is also given at the end of the paper.
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The water quality monitoring technology based on ultraviolet spectrum analysis has the characteristics of small volume, low cost, and no secondary pollution, and it doesn't need any reagent and sample pretreatment. On account of these characteristics, the direct ultra-violet technology has remarkable superiority over traditional technologies when applied in online monitoring of drinking water, surface water and industrial wastewater, and it has become an important development tendency of modern water monitoring technologies. The principle, characteristics, present situation and development trend of modern water quality monitoring technology based on ultra-violet spectrum analysis were introduced, and the key technical problems were further discussed in this paper.
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The adsorption properties of Cu, Ag, Zn, and Cd-modified SnP3 monolayers for H2S have been studied using density functional theory (DFT). Based on phonon spectrum calculations, a structurally stable intrinsic SnP3 monolayer was obtained, based on which four metal-modified SnP3 monolayers were constructed, and the band gaps of the modified SnP3 monolayers were significantly reduced. The adsorption capacity of Cu, Zn-modified SnP3 was better than that of Ag, Cd-modified SnP3. The adsorption energies of Cu-modified SnP3 and Zn-modified SnP3 for H2S were -0.749 eV and -0.639 eV, respectively. In addition, Cu-modified SnP3 exhibited chemisorption for H2S, while Zn-modified SnP3 exhibited strong physisorption, indicating that it can be used as a sensor substrate. Co-adsorption studies showed that ambient gases such as N2, O2, and H2O had little effect on H2S. The band gap change rate of Zn-modified SnP3 after adsorption of H2S was as high as -28.52%. Recovery time studies based on Zn-modified SnP3 showed that the desorption time of H2S was 0.064 s at 298 K. Therefore, Zn-modified SnP3 can be used as a promising sensor substrate for H2S due to its good selectivity, sensitivity, and fast recovery time.