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Enhanced Performance of Ge Photodiodes via Monolithic Antireflection Texturing and α-Ge Self-Passivation by Inverse Metal-Assisted Chemical Etching.
Kim, Munho; Yi, Soongyu; Kim, Jeong Dong; Yin, Xin; Li, Jun; Bong, Jihye; Liu, Dong; Liu, Shih-Chia; Kvit, Alexander; Zhou, Weidong; Wang, Xudong; Yu, Zongfu; Ma, Zhenqiang; Li, Xiuling.
Afiliação
  • Kim M; Department of Electrical and Computer Engineering and Micro and Nanotechnology Laboratory, Materials Research Laboratory , University of Illinois at Urbana-Champaign , Urbana , Illinois 61801 , United States.
  • Yi S; Department of Electrical and Computer Engineering , University of Wisconsin at Madison , Madison , Wisconsin 53706 , United States.
  • Kim JD; Department of Electrical and Computer Engineering and Micro and Nanotechnology Laboratory, Materials Research Laboratory , University of Illinois at Urbana-Champaign , Urbana , Illinois 61801 , United States.
  • Yin X; Department of Material and Science Engineering , University of Wisconsin at Madison , Madison , Wisconsin 53706 , United States.
  • Li J; Department of Material and Science Engineering , University of Wisconsin at Madison , Madison , Wisconsin 53706 , United States.
  • Bong J; Department of Electrical and Computer Engineering , University of Wisconsin at Madison , Madison , Wisconsin 53706 , United States.
  • Liu D; Department of Electrical and Computer Engineering , University of Wisconsin at Madison , Madison , Wisconsin 53706 , United States.
  • Liu SC; Department of Electrical Engineering , University of Texas at Arlington , Arlington , Texas 76019 , United States.
  • Kvit A; Materials Science Center , University of Wisconsin at Madison , Madison , Wisconsin 53706 , United States.
  • Zhou W; Department of Electrical Engineering , University of Texas at Arlington , Arlington , Texas 76019 , United States.
  • Wang X; Department of Material and Science Engineering , University of Wisconsin at Madison , Madison , Wisconsin 53706 , United States.
  • Yu Z; Department of Electrical and Computer Engineering , University of Wisconsin at Madison , Madison , Wisconsin 53706 , United States.
  • Ma Z; Department of Electrical and Computer Engineering , University of Wisconsin at Madison , Madison , Wisconsin 53706 , United States.
  • Li X; Department of Electrical and Computer Engineering and Micro and Nanotechnology Laboratory, Materials Research Laboratory , University of Illinois at Urbana-Champaign , Urbana , Illinois 61801 , United States.
ACS Nano ; 12(7): 6748-6755, 2018 Jul 24.
Article em En | MEDLINE | ID: mdl-29847725
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Texto completo: 1 Base de dados: MEDLINE Idioma: En Revista: ACS Nano Ano de publicação: 2018 Tipo de documento: Article País de afiliação: Estados Unidos
Texto completo
Imprimir
XML
PubMed Links
Buscar no Google

Texto completo: 1 Base de dados: MEDLINE Idioma: En Revista: ACS Nano Ano de publicação: 2018 Tipo de documento: Article País de afiliação: Estados Unidos