RESUMO
Magnetic force microscope Co spike tips with lateral magnetic resolution of 10 nm have been prepared. The Co spikes are grown by electron beam induced deposition of Co from Co(2)(CO)(8) gas precursor. The high resolution Co spikes are fabricated at the spot of a tightly focused electron beam on the tip of commercial atomic force microscope cantilevers. Qualitative investigations indicate that a spike grown on a planar base of Co improves the signal to noise.
RESUMO
We report a nanofabrication method that combines block copolymer directed assembly with e-beam lithography to achieve highly uniform rectangular patterns with a critical dimension of 16 nm, a full pitch of 27 nm, and arbitrary aspect ratio. This fabrication method enables geometries that are not natural to block copolymer assembly, preserves both the feature uniformity and the center-to-center spacing of the original block copolymer, sustains long-range translational order, and facilitates high-resolution, high-density patterns through feature density multiplication. These highly uniform arrays of dense rectangular features are particularly attractive for fabricating magnetic bit patterned media with high bit aspect ratio.
RESUMO
Self-assembling materials spontaneously form structures at length scales of interest in nanotechnology. In the particular case of block copolymers, the thermodynamic driving forces for self-assembly are small, and low-energy defects can get easily trapped. We directed the assembly of defect-free arrays of isolated block copolymer domains at densities up to 1 terabit per square inch on chemically patterned surfaces. In comparing the assembled structures to the chemical pattern, the density is increased by a factor of four, the size is reduced by a factor of two, and the dimensional uniformity is vastly improved.