Design and Characterization of 5 µm Pitch InGaAs Photodiodes Using In Situ Doping and Shallow Mesa Architecture for SWIR Sensing.

This paper presents the complete design, fabrication, and characterization of a shallow-mesa photodiode for short-wave infra-red (SWIR) sensing. We characterized and demonstrated photodiodes collecting 1.55 µm photons with a pixel pitch as small as 3 µm. For a 5 µm pixel pitch photodiode, we measured the external quantum efficiency reaching as high as 54%. With substrate removal and an ideal anti-reflective coating, we estimated the internal quantum efficiency as achieving 77% at 1.55 µm. The best measured dark current density reached 5 nA/cm2 at -0.1 V and at 23 °C. The main contributors responsible for this dark current were investigated through the study of its evolution with temperature. We also highlight the importance of passivation with a perimetric contribution analysis and the correlation between MIS capacitance characterization and dark current performance.

Partially localized hybrid surface plasmon mode for thin-film semiconductor infrared photodetection.

We use numerical simulations to show that a suitably dimensioned periodic arrangement of vertical metallic metal-dielectric-metal nanocavities supports a hybrid plasmonic mode whose spatial electric field distribution is suitable for use in infrared photodetectors based on an unpatterned semiconductor thin-film absorbing layer. The partially localized nature of the hybrid mode offers reduced sensitivity to the angle of incoming light and smaller pixel sizes compared with surface plasmonic modes coupled by diffraction.