RESUMO
The accumulation of microbes especially in the air and in water bodies is causing the major disease outbreaks. Indoor environment remediation methods are necessary today to clean up these microbes. Among the remediation methods available, in situ generation of highly reactive and oxidizing radical species by advanced oxidation processes (AOPs) inactivate most of the microbes unselectively. Of these AOPs, photocatalytic microbial disinfection especially under indoor conditions is of great interest to maintain microbe-free indoor environment. For efficient microbes' inactivation under indoor conditions, the near IR and IR response of the photocatalysts must be improved. Though the photocatalytic disinfection of microbes using semiconductor-based photocatalysts has been extensively investigated, most of the photocatalysts that have been investigated are either weekly responsive or totally not irresponsive to IR photons due to inappropriate bandgap energies. Several strategies have been investigated to enhance the light harvesting properties of semiconductor based photocatalysts under indoor conditions and make them active to near IR and IR radiations. This review summarizes the recent progress in the field of materials for photocatalysts employed for microbial removal in indoor environments over the past decade as well as outlines key perspectives to enlighten future researches. The paper details the fundamentals of photocatalysis and basic properties of photocatalytic materials in the disinfection of common microbes under indoor conditions. The applications of photocatalytic materials in the disinfection of microbes in indoor environmental conditions are discussed and reviewed. Finally, the remaining challenges and future strategies/prospects in the design and synthesis of IR (and near IR) responsive photocatalysts are discussed.