Management of massive cerebral infarction as a complication of post-tonsillectomy and analysis of the risk factors: a case report.

BACKGROUND: The majority of postoperative complications of tonsillectomy are bleeding. However, massive cerebral infarction following haemostasis is a very rare and serious complication and has rarely been reported clinically. CASE PRESENTATION: We performed a left tonsillectomy on a patient with chronic tonsillitis. After that, active bleeding was found under the tonsillar fossa, so an exploratory hypopharyngeal haemostasis was performed. However, the bleeding worsened intraoperatively, so the patient was converted to a cervical angiographic embolization. The interventional procedure was completed successfully without an ectopic embolic event. After the procedure, the patient was transferred to the intensive care unit (ICU) and was diagnosed with acute massive cerebral infarction in the left cerebral hemisphere after awakening symptoms combined with cranial computed tomography angiography (CTA) results. Symptomatic treatment such as sedation and analgesia, dehydration to lower intracranial pressure, and maintenance of respiratory and circulatory stability was then administered. After treatment, the patient's condition stabilized and he was transferred to the rehabilitation physiotherapy unit for rehabilitation. CONCLUSION: Post-tonsillectomy haemorrhage can be augmented with a carotid arteriogram to clarify whether the tonsillar fossa is at a safe distance from the posterior internal carotid artery. Furthermore, interventional haemostasis can also be performed as early as possible to reduce the incidence of complications in cases of persistent post-tonsillectomy bleeding.

Multi-Function of the Ni Interlayer in the Design of a BiVO4-Based Photoanode for Photoelectrochemical Water Splitting.

BiVO4 with an appropriate band structure is considered to be an ideal candidate for photoanodes. However, slow water oxidation kinetics and low charge separation efficiency seriously restrict its application. To address these issues, an NF/N/BVO photoanode with a hierarchical network structure was successfully constructed by direct-current magnetron sputtering of Ni followed by electrochemical deposition of nickel-iron layered double hydroxide (NiFe-LDH) on BiVO4. A photocurrent density of 4.50 mA/cm2 was obtained for NF/N/BVO, which was 2.4 times that for pristine BiVO4. The introduction of the Ni layer contributed to the following growth of NiFe-LDH nanosheets with larger size, which acted as active sites and speeded up water oxidation kinetics. Furthermore, surface photovoltage microscopy revealed that Ni and NiFe-LDH acted as the electron collector and hole reservoir, respectively. The co-existence of the two components constituted a highly efficient surface charge separation structure, which was one of the important issues for the excellent water oxidation activity.