Nanometer flat blazed x-ray gratings using ion beam figure correction.

With the development of nanometer accuracy stitching interferometry, ion beam figuring (IBF) of x-ray mirrors can now be achieved with unprecedented performance. However, the process of producing x-ray diffraction gratings on these surfaces may degrade the figure quality due to process errors introduced during the ruling of the grating grooves. To address this challenge, we have investigated the post-production correction of gratings using IBF, where stitching interferometry is used to provide in-process feedback. A concern with ion beam correction in this case is that ions will induce enough surface mobility of atoms to cause smoothing of the grating structure and degradation of diffraction efficiency. In this study we found however that it is possible to achieve a nanometer-level planarity of the global grating surface with IBF, while preserving the grating structure. The preservation was so good, that we could not detect a change in the diffraction efficiency after ion beam correction. This is of major importance in achieving ultra-high spectral resolution, and the preservation of brightness for coherent x-ray beams.

Experimental testing of a prototype cantilevered liquid-nitrogen-cooled silicon mirror.

This report presents testing of a prototype cantilevered liquid-nitrogen-cooled silicon mirror. This mirror was designed to be the first mirror for the new soft X-ray beamlines to be built as part of the Advanced Light Source Upgrade. Test activities focused on fracture, heat transfer, modal response and distortion, and indicated that the mirror functions as intended.

6000 lines/mm blazed grating for a high-resolution x-ray spectrometer.

We have designed and fabricated a high groove density blazed grating for a Resonant Inelastic X-ray Scattering spectrometer for the new Qerlin beamline at the Advanced Light Source (ALS) synchrotron facility. The gratings were fabricated using a set of nanofabrication techniques including e-beam lithography, nanoimprint, plasma etch, and anisotropic wet etching. Two gratings with groove density of 6000 lines/mm and 3000 lines/mm and optimized for operation in the 1st and 2nd negative diffraction order respectively were fabricated and tested. We report on fabrication details and characterization of the gratings at beamline 6.3.2 of the ALS.

Highly efficient ultra-low blaze angle multilayer grating.

We have developed an advanced process for blaze angle reduction of x-ray gratings for the soft, tender, and EUV spectral ranges. The process is based on planarization of an anisotropically etched Si blazed grating followed by a chemically selective plasma etch. This provides a way to adjust the blaze angle to any lower value with high accuracy. Here we demonstrate the reduction of the blaze angle to an extremely low value of 0.04°±0.004°. For a 100 lines/mm grating with a Mo/Si multilayer coating, the grating exhibits diffraction efficiency of 58% in the 1st diffraction order at a wavelength of 13.3 nm. This technique will be applicable to a wide range of uses of high efficiency gratings for synchrotron sources, as well as for Free Electron Lasers (FEL).

Development of a 3-D energy-momentum analyzer for meV-scale energy electrons.

In this article, we report on the development of a time-of-flight based electron energy analyzer capable of measuring the 3-D momentum and energy distributions of very low energy (millielectronvolt-scale) photoemitted electrons. This analyzer is capable for measuring energy and 3-D momentum distributions of electrons with energies down to 1 meV with a sub-millielectronvolt energy resolution. This analyzer is an ideal tool for studying photoemission processes very close to the photoemission threshold and also for studying the physics of photoemission based electron sources.

Ultra-low blaze angle gratings for synchrotron and free electron laser applications.

We have developed a method for the manufacture of x-ray diffraction gratings with arbitrarily small blaze angles. These gratings are made by a process in which a high blaze angle grating made by anisotropic etching of Si (111) is subjected to planarization and reactive ion etching. Differential etching of the planarization medium and silicon ensures reduction of the blaze angle. Repeated application of this process leads to gratings of increasing perfection with an arbitrarily small blaze angle. This opens the way to highly efficient low line density gratings, to damage resistant gratings for ultra-high power applications such as free electron lasers, and for extension of the use of gratings into the hard x-ray energy range for dispersive spectroscopy.

Hartmann characterization of the PEEM-3 aberration-corrected X-ray photoemission electron microscope.

Aberration correction by an electron mirror dramatically improves the spatial resolution and transmission of photoemission electron microscopes. We will review the performance of the recently installed aberration corrector of the X-ray Photoemission Electron Microscope PEEM-3 and show a large improvement in the efficiency of the electron optics. Hartmann testing is introduced as a quantitative method to measure the geometrical aberrations of a cathode lens electron microscope. We find that aberration correction leads to an order of magnitude reduction of the spherical aberrations, suggesting that a spatial resolution of below 100 nm is possible at 100% transmission of the optics when using x-rays. We demonstrate this improved performance by imaging test patterns employing element and magnetic contrast.

Large area nanoimprint enables ultra-precise x-ray diffraction gratings.

A process for fabrication of ultra-precise diffraction gratings for high resolution x-ray spectroscopy was developed. A grating pattern with constant or variable line spacing (VLS) is recorded on a quartz plate by use of e-beam lithography with nanometer scale accuracy of the groove placement. The pattern is transferred to a massive grating blank by large area nanoimprint followed by dry or/and wet etching for groove shaping. High fidelity of the nanoimprint transfer step was confirmed by differential wavefront measurements. Successful implementation of the suggested fabrication approach was demonstrated by fabrication of a lamellar 900 lines/mm VLS grating for a soft x-ray fluorescence spectrometer.

Refraction effects in soft x-ray multilayer blazed gratings.

A 2500 lines/mm Multilayer Blazed Grating (MBG) optimized for the soft x-ray wavelength range was fabricated and tested. The grating coated with a W/B4C multilayer demonstrated a record diffraction efficiency in the 2nd blazed diffraction order in the energy range from 500 to 1200 eV. Detailed investigation of the diffraction properties of the grating demonstrated that the diffraction efficiency of high groove density MBGs is not limited by the normal shadowing effects that limits grazing incidence x-ray grating performance. Refraction effects inherent in asymmetrical Bragg diffraction were experimentally confirmed for MBGs. The refraction affects the blazing properties of the MBGs and results in a shift of the resonance wavelength of the gratings and broadening or narrowing of the grating bandwidth depending on diffraction geometry. The true blaze angle of the MBGs is defined by both the real structure of the multilayer stack and by asymmetrical refraction effects. Refraction effects can be used as a powerful tool in providing highly efficient suppression of high order harmonics.

A novel system for measurement of the transverse electron momentum distribution from photocathodes.

The transverse momentum of electrons produced by a photocathode contributes significantly to the performance of several different types of accelerator-based light sources, such as Free Electron Lasers, as well as systems designed for ultrafast electron diffraction and dynamic transmission electron microscopy. Minimization of the transverse emittance from photocathodes is the subject of intensive research, and therefore measurement of this parameter is of great importance. Here, we describe a simple system that offers real time measurements of transverse emittance and can be easily integrated into the photocathode fabrication process.

Multilayer-coated blazed grating with variable line spacing and a variable blaze angle.

The blazing ability of multilayer-coated blazed gratings (MBGs) was systematically investigated via numerical calculation of the diffraction efficiency with a rigorous electromagnetic simulation code. It was found that the blazing condition is not exact and allows significant deviation from the ideal situation for ultra-dense MBGs. A mismatch of the interfaces of the multilayer (ML) stacks of adjacent grooves results in a modified effective blaze angle, which gives the opportunity to control and tune precisely the blaze angle via a proper choice of ML d-spacing. Also this allows a new kind of x-ray gratings that have a variable line spacing (VLS) as well as a variable blaze angle. Precise adjustment of a local blaze angle of a VLS MBG can be achieved with a laterally graded ML, providing very high diffraction efficiency for the whole area of the grating.

Enhancement of diffraction efficiency via higher-order operation of a multilayer blazed grating.

Imperfections in the multilayer stack deposited on a saw-tooth substrate are the main factor limiting the diffraction efficiency of extreme ultraviolet and soft x-ray multilayer-coated blazed gratings (MBGs). Since the multilayer perturbations occur in the vicinity of antiblazed facets of the substrates, reduction of the groove density of MBGs is expected to enlarge the area of unperturbed multilayer and result in higher diffraction efficiency. At the same time the grating should be optimized for higher-order operation in order to keep high dispersion and spectral resolution. In this work we show the validity of this approach and demonstrate significant enhancement of diffraction efficiency of MBGs using higher-order diffraction. A new record for diffraction efficiency of 52% in the second diffraction order was achieved for an optimized MBG with groove density of 2525 lines/mm at the wavelength of 13.4 nm.

A stigmatic ultraviolet-visible monochromator for use with a high brightness laser driven plasma light source.

Laser driven plasma light sources offer highly intense output in the UV-visible region combined with a source size as small as 100 µm. In order to effectively use the small source size in high brightness applications, a stigmatic monochromator and focusing system must be used. Here we describe a simple brightness preserving optical system that should be useful across a broad range of applications. The output flux of this system is between 6 × 10(11) ph∕s and 4 × 10(12) ph∕s with a spectra resolution of 1.7 nm and field spot size of 0.1 mm from the UV to the VIS spectra range.

Compact cryogenically cooled Ti:Sapphire dual multi-kilohertz amplifiers for synchrotron radiation ultra-fast x-ray applications.

A titanium-doped sapphire regenerative dual-amplifier array operating at multi-kHz repetition rates has been developed for synchrotron radiation ultra-fast x-ray applications. The thermal lensing of the crystal in the amplifiers is virtually eliminated by cryogenic cooling of the laser crystal. The output energy of the amplifiers is measured to be greater than 2.6 mJ and the pulse length was compressed to less than 70 fs. The output laser mode is a near perfect Gaussian TEM00 with an M(2) factor of 1.02. The performance of the amplifier system is in excellent agreement with theoretical calculation.

Surface-plasmon resonance-enhanced multiphoton emission of high-brightness electron beams from a nanostructured copper cathode.

We experimentally investigate surface-plasmon assisted photoemission to enhance the efficiency of metallic photocathodes for high-brightness electron sources. A nanohole array-based copper surface was designed to exhibit a plasmonic response at 800 nm, fabricated using the focused ion beam milling technique, optically characterized and tested as a photocathode in a high power radio frequency photoinjector. Because of the larger absorption and localization of the optical field intensity, the charge yield observed under ultrashort laser pulse illumination is increased by more than 100 times compared to a flat surface. We also present the first beam characterization results (intrinsic emittance and bunch length) from a nanostructured photocathode.

Plasmon-enhanced photocathode for high brightness and high repetition rate x-ray sources.

In this Letter, we report on the efficient generation of electrons from metals using multiphoton photoemission by use of nanostructured plasmonic surfaces to trap, localize, and enhance optical fields. The plasmonic surface increases absorption over normal metals by more than an order of magnitude, and due to the localization of fields, this results in over 6 orders of magnitude increase in effective nonlinear quantum yield. We demonstrate that the achieved quantum yield is high enough for use in rf photoinjectors operating as electron sources for MHz repetition rate x-ray free electron lasers.

Plasmon resonance tuning in metallic nanocavities.

Nanocavities fabricated in a metallic surface have important and technologically useful properties of complete light absorption and strong field enhancement. Here, we demonstrate how a nanometerthick alumina deposition inside such a cavity can be used to gain an exquisite control over the resonance wavelength. This process allows achieving a precise control over the spectral response and is completely reversible allowing many tuning attempts to be made on a single structure until the optimum performance is achieved.

Ultra-high efficiency multilayer blazed gratings through deposition kinetic control.

Diffraction efficiency of multilayer-coated blazed gratings (MBG) strongly depends on the perfection of the sawtooth-shaped layers in the overall composite structure. Growth of multilayers on sawtooth substrates should be carefully optimized to reduce groove profile distortion and, at the same time, to avoid significant roughening of multilayer interfaces. In this work, we report on a way to optimize growth of sputter-deposited Mo/Si multilayers on sawtooth substrates through variation of the sputtering gas pressure. We believe a new record for diffraction efficiency of 44% was achieved for an optimized MBG with groove density of 5250 lines/mm at the wavelength of 13.1 nm.

Soft x-ray scattering facility at the Advanced Light Source with real-time data processing and analysis.

We present the development and characterization of a dedicated resonant soft x-ray scattering facility. Capable of operation over a wide energy range, the beamline and endstation are primarily used for scattering from soft matter systems around the carbon K-edge (∼285 eV). We describe the specialized design of the instrument and characteristics of the beamline. Operational characteristics of immediate interest to users such as polarization control, degree of higher harmonic spectral contamination, and detector noise are delineated. Of special interest is the development of a higher harmonic rejection system that improves the spectral purity of the x-ray beam. Special software and a user-friendly interface have been implemented to allow real-time data processing and preliminary data analysis simultaneous with data acquisition.

Collective behavior of impedance matched plasmonic nanocavities.

Nanometer sized cavities arranged as a subwavelength metallic grating can provide omni-directional and complete absorption of light. We present an explanation of this extraordinary phenomenon as a collective resonant response of a system based on a surface impedance model. This model gives a straightforward way to design systems for optimum light trapping performance and as well gives fundamental insights into the interaction of light with metals at the nanoscale.