Fabrication of Large-Area Silicon Spherical Microlens Arrays by Thermal Reflow and ICP Etching.

In this paper, we proposed an efficient and high-precision process for fabricating large-area microlens arrays using thermal reflow combined with ICP etching. When the temperature rises above the glass transition temperature, the polymer cylinder will reflow into a smooth hemisphere due to the surface tension effect. The dimensional differences generated after reflow can be corrected using etching selectivity in the following ICP etching process, which transfers the microstructure on the photoresist to the substrate. The volume variation before and after reflow, as well as the effect of etching selectivity using process parameters, such as RF power and gas flow, were explored. Due to the surface tension effect and the simultaneous molding of all microlens units, machining a 3.84 × 3.84 mm2 silicon microlens array required only 3 min of reflow and 15 min of ICP etching with an extremely low average surface roughness Sa of 1.2 nm.

All-Dielectric Gratings with High-Quality Structural Colors.

We present a dual-layer hafnium dioxide (HfO2) grating capable of full-color modulation in the visible spectrum by leveraging the magnetic dipole resonance induced by the lower-layer HfO2 grating, while the upper-layer HfO2 grating serves as a refractive index matching layer to effectively suppress high-order Mie resonances at shorter wavelengths. The HfO2/HfO2 grating exhibits a significantly larger distribution area in the CIE 1931 chromaticity diagram compared to the HfO2 grating. Furthermore, the structural color saturation closely approximates that of monochromatic light. Under varying background refractive index environments, this structure consistently exhibits high-quality structural color. However, the hue of the structural color undergoes alterations. When the polarization angle is below 20°, the saturation of the acquired structural color remains remarkably consistent. However, exceeding 20° results in a significant degradation in the quality of the structural color. This study demonstrates the promising potential for diverse applications, encompassing fields such as imaging and displays.

Investigation of perfect narrow-band absorber in silicon nano hole array.

In this paper, we proposed a triple layer structure consisting of the bottom silver layer, thin silicon oxide space layer, and ultrathin semiconductor silicon film with nano hole array achieving three absorption peaks with narrow band. The absorption spectrum can be easily controlled by adjusting the structural parameters including the radius and period of the nano hole array, and the maximal absorption can reach 99.0% and the narrowest full width of half maximum can reach about 6.5 nm in theory. We also clarified the physical mechanism of the proposed structure in details by finite-difference time-domain simulation, in which the three narrow band perfect adsorption peaks can be attributed to electric dipole resonance, magnetic dipole resonance and plasmonic resonance respectively. At the same time, we used a low-cost nanosphere lithography method to fabricate the proposed nano hole array in large area. In experiment, the absorption peak of the proposed triple layer structure can reach up to 98.3% and the narrowest full width of half maximum can reach up to about 10.1 nm. The highest quality factor Q can reach up to 98.4. This work can open a new avenue for high-quality factor narrow band perfect absorption using ultrathin semiconductor film and benefit for many fields such as infrared sensors, plasmonic filters, and hyperspectral imaging.

Inductively Coupled Plasma Dry Etching of Silicon Deep Trenches with Extremely Vertical Smooth Sidewalls Used in Micro-Optical Gyroscopes.

Micro-optical gyroscopes (MOGs) place a range of components of the fiber-optic gyroscope (FOG) onto a silicon substrate, enabling miniaturization, low cost, and batch processing. MOGs require high-precision waveguide trenches fabricated on silicon instead of the ultra-long interference ring of conventional F OGs. In our study, the Bosch process, pseudo-Bosch process, and cryogenic etching process were investigated to fabricate silicon deep trenches with vertical and smooth sidewalls. Different process parameters and mask layer materials were explored for their effect on etching. The effect of charges in the Al mask layer was found to cause undercut below the mask, which can be suppressed by selecting proper mask materials such as SiO2. Finally, ultra-long spiral trenches with a depth of 18.1 µm, a verticality of 89.23°, and an average roughness of trench sidewalls less than 3 nm were obtained using a cryogenic process at -100 °C.

Early Supplementation with Starter Can Improve Production Performance of Lambs but this Growth Advantage Disappears after 154 Days of Age.

The aim of this experiment was to study the sustained effects of early supplementation with a starter on the performance of lambs during the pre-weaning, post-weaning, and fattening periods. Sixty male Hu lambs (3.59 ± 0.05 kg) were randomly assigned to two (30 lambs per group) treatments. The lambs were fed milk replacer from three days of age. The early supplementation (ES) group was supplemented with a starter ration at seven days of age, the control (CON) group was supplemented at 21 days of age, and lambs in both groups were weaned from milk replacer at 28 days of age. Eight lambs from each group were randomly slaughtered at 98 days of age, and the remaining lambs were fed the same nutrient level of a fattening ration until slaughter at 200 days of age. The results showed that early supplementation with starter significantly improved average daily feed intake (ADFI) and average daily weight gain (ADG) in the pre-weaning period (7-28 days of age), and ADFI and slaughter performance (live weight before slaughter, carcass weight and dressing percentage) in the post-weaning period (29-98 days of age, p < 0.05). In addition, early supplementation with the starter had no significant effect (p > 0.05) on ADFI, ADG, and slaughter performance, but significantly decreased (p < 0.05) the feed-to-gain ratio (F/G) of lambs during the fattening period (99-200 days of age). In addition, early supplementation with starter increased the ratio of rumen and reticulum weight to total stomach weight in lambs (p < 0.05). In conclusion, early supplementation with starter can reduce feed costs and improve the performance of lambs, while the growth advantage produced by early supplementation had initially disappeared by 154 days of age.

Near-infrared narrow-band minus filter based on a Mie magnetic dipole resonance.

The traditional minus filter is composed of many layers of thin films, which makes it difficult and complicated to manufacture. It is sensitive to incident light angle and polarization. Here, we propose a near-infrared narrow-band minus filter with a full width at half maximum around 5 nm made of all-dielectric Si-SiO2 structures without any ohmic loss. The stop band transmittance of the proposed filter is close to 0, while its broad pass band transmittance is as high as 90% in the work wavelength range. Theoretical analysis shows that the transmission dip originated from magnetic dipole resonance: Its position can be tuned from 1.3 µm to 1.8 µm by changing the thickness of Si structure, and the proposed structure is insensitive to changes in incident light angle and polarization angle. We further studied its potential applications as a refractive index sensor. The sensitivity of dip1 and dip2 are as high as 953.53 nm/RIU and 691.09 nm/RIU, while their figure of merit is almost unchanged: 59.59 and 115.18, respectively.

Fabrication of High Precision Silicon Spherical Microlens Arrays by Hot Embossing Process.

In this paper, a high-precision, low-cost, batch processing nanoimprint method is proposed to process a spherical microlens array (MLA). The nanoimprint mold with high surface precision and low surface roughness was fabricated by single-point diamond turning. The anti-sticking treatment of the mold was carried out by perfluorooctyl phosphoric acid (PFOPA) liquid deposition. Through the orthogonal experiment of hot embossing with the treated mold and subsequent inductively coupled plasma (ICP) etching, the microstructure of MLA was transferred to the silicon substrate, with a root mean square error of 17.7 nm and a roughness of 12.1 nm Sa. The average fitted radius of the microlens array units is 406.145 µm, which is 1.54% different from the design radius.

Microcavity electrodynamics of hybrid surface plasmon polariton modes in high-quality multilayer trench gratings.

In common plasmonic structures, absorption and radiation losses are often mutually restricted and can seriously influence the device performance. The current study presents a compound structure composed of multilayer grating stripes and multilayer shallow trenches. A small depth was adopted for the trench configuration to exclude the extra bend loss. These two sections supported Fabry-Perot resonance and cavity modes, respectively, with hybrid modes formed through intercoupling. In addition, the total loss for the entire framework was clearly reduced due to the introduction of the trench geometry, indicating that both absorption and radiation losses were successfully taken into consideration in the compound structure. Significantly, such a low loss realized by the hybridization of surface plasmon polariton modes has rarely been seen before. Moreover, the debatable relationship between the total and partial quality factors was described for the first time based on a hybrid mode analysis to establish a new approach to investigate the different resonance modes. In the detailed calculation process, the relative electric field intensity was first adopted to stipulate the effective areas for the various modes, which is more reasonable than using the common definition that is based on a unit structure. The multilayer trench grating exhibited a relatively low loss without weakening energy localization, which is significant in the design of plasmonic devices.

Compensating the Degradation of Near-Infrared Absorption of Black Silicon Caused by Thermal Annealing.

We propose the use of thin Ag film deposition to remedy the degradation of near-infrared (NIR) absorption of black Si caused by high-temperature thermal annealing. A large amount of random and irregular Ag nanoparticles are formed on the microstructural surface of black Si after Ag film deposition, which compensates the degradation of NIR absorption of black Si caused by thermal annealing. The formation of Ag nanoparticles and their contributions to NIR absorption of black Si are discussed in detail.

[Multilayer mirrors used for the moon-based EUV imager].

The EUV imager is used to observe the 30.4 nm radiation of the earth's plasmasphere on the lunar surface. The 30.4 nm multilayer is the key optical part of the imager. According to the technical parameters, the B4 C/Mg, B4 C/Mg2Si, B4 C/Al, B4 C/Si, Mo/Si and so on were chosen. The period thickness, ratio of the material and the number of the periods were optimized and the reflectivity of those multilayers were calculated. In consideration of the lunar environment, the Mo/Si and the B4 C/Si multilayer were deposited by magnetron sputtering coating plant. The reflectivity of Mo/Si and B4 C/Si multilayer at 30.4 nm is 15.3% and 22.8% respectively.