Aperture-Controlled Fabrication of All-Dielectric Structural Color Pixels.

While interference colors have been known for a long time, conventional color filters have large spatial dimensions and cannot be used to create compact pixelized color pictures. Here we report a simple yet elegant interference-based method of creating microscopic structural color pixels using a single-mask process using standard UV photolithography on an all-dielectric substrate. The technology makes use of the varied aperture-controlled physical deposition rate of low-temperature silicon dioxide inside a hollow cavity to create a thin-film stack with the controlled bottom layer thickness. The stack defines which wavelengths of the reflected light interfere constructively, and thus the cavities act as micrometer-scale pixels of a predefined color. Combinations of such pixels produce vibrant colorful pictures visible to the naked eye. Being fully CMOS-compatible, wafer-scale, and not requiring costly electron-beam lithography, such a method paves the way toward large scale applications of structural colors in commercial products.

Pitfalls in the spectral measurements of polarization-altering metasurfaces.

The optical characterization of metasurfaces and nanostructures that alter the polarization of light is tricky and can lead to unphysical results, such as reflectance beyond unity. We track the origin of such pitfalls to the response of some typical optical components used in a commercial microscope or a custom-made setup. In particular, the beam splitter and some mirrors have different responses for both polarizations and can produce wrong results. A simple procedure is described to correct these erroneous results, based on the optical characterization of the different components in the optical setup. With this procedure, the experimental results match the numerical simulations perfectly. The methodology described here is simple and will enable the accurate spectral measurements of nanostructures and metasurfaces that alter the polarization of the incoming light.

Robustness Analysis of Metasurfaces: Perfect Structures Are Not Always the Best.

Optical metasurfaces rely on subwavelength scale nanostructures, which puts significant constraints on nanofabrication accuracies. These constraints are becoming increasingly important, as metasurfaces are maturing toward real applications that require the fabrication of very large area samples. Here, we focus on beam steering gradient metasurfaces and show that perfect nanofabrication does not necessarily equate with best performances: metasurfaces with missing elements can actually be more efficient than intact metasurfaces. Both plasmonic metasurfaces in reflection and dielectric metasurfaces in transmission are investigated. These findings are substantiated by experiments on purposely misfabricated metasurfaces and full-wave calculations. A very efficient quasi-analytical model is also introduced for the design and simulations of metasurfaces; it agrees very well with full-wave calculations. Our findings indicate that the substrate properties play a key role in the robustness of a metasurface and the smoothness of the approximated phase gradient controls the device efficiency.

A Low-Temperature Annealing Method for Alloy Nanostructures and Metasurfaces: Unlocking a Novel Degree of Freedom.

The material and exact shape of a nanostructure determine its optical response, which is especially strong for plasmonic metals. Unfortunately, only a few plasmonic metals are available, which limits the spectral range where these strong optical effects can be utilized. Alloying different plasmonic metals can overcome this limitation, at the expense of using a high-temperature alloying process, which adversely destroys the nanostructure shape. Here, a low-temperature alloying process is developed where the sample is heated at only 300 °C for 8 h followed by 30 min at 450 °C and Au-Ag nanostructures with a broad diversity of shapes, aspect ratios, and stoichiometries are fabricated. Energy-dispersive X-ray spectroscopy and X-ray photoelectron spectroscopy analyses confirm the homogeneous alloying through the entire sample. Varying the alloy stoichiometry tunes the optical response and controls spectral features, such as Fano resonances. Binary metasurfaces that combine nanostructures with different stoichiometries are fabricated using multiple-step electron-beam lithography, and their optical function as a hologram or a Fresnel zone plate is demonstrated at the visible wavelength of λ = 532 nm. This low-temperature annealing technique provides a versatile and cost-effective way of fabricating complex Au-Ag nanostructures with arbitrary stoichiometry.

Ultrathin Planar Cavity Metasurfaces.

An ultrathin planar cavity metasurface is proposed based on ultrathin film interference and its practicability for light manipulation in visible region is experimentally demonstrated. Phase of reflected light is modulated by finely adjusting the thickness of amorphous silicon (a-Si) by a few nanometers on an aluminum (Al) substrate via nontrivial phase shifts at the interfaces and interference of multireflections generated from the planar cavity. A phase shift of π, the basic requirement for two-level phase metasurface systems, can be accomplished with an 8 nm thick difference. For proof of concept, gradient metasurfaces for beam deflection, Fresnel zone plate metalens for light focusing, and metaholograms for image reconstruction are presented, demonstrating polarization-independent and broadband characteristics. This novel mechanism for phase modulation with ultrathin planar cavity provides diverse routes to construct advanced flat optical devices with versatile applications.