Autocatalytic water dissociation on Cu(110) at near ambient conditions.
J Am Chem Soc
; 130(9): 2793-7, 2008 Mar 05.
Article
em En
| MEDLINE
| ID: mdl-18257559
ABSTRACT
Autocatalytic dissociation of water on the Cu(110) metal surface is demonstrated on the basis of X-ray photoelectron spectroscopy studies carried out in situ under near ambient conditions of water vapor pressure (1 Torr) and temperature (275-520 K). The autocatalytic reaction is explained as the result of the strong hydrogen-bond in the H2O-OH complex of the dissociated final state, which lowers the water dissociation barrier according to the Brønsted-Evans-Polanyi relations. A simple chemical bonding picture is presented which predicts autocatalytic water dissociation to be a general phenomenon on metal surfaces.
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MEDLINE
Idioma:
En
Ano de publicação:
2008
Tipo de documento:
Article