A simple top-down/bottom-up approach to sectored, ordered arrays of nanoscopic elements using block copolymers.
Small
; 5(9): 1064-9, 2009 May.
Article
em En
| MEDLINE
| ID: mdl-19189333
ABSTRACT
A top-down/bottom-up approach is demonstrated by combining electron-beam (e-beam) lithography and a solvent annealing process. Micellar arrays of polystyrene-block-poly(4-vinylpyridine) (PS-b-P4VP) with a high degree of lateral order can be produced on a surface where sectoring is defined by e-beam patterning. The e-beam is used to crosslink the block copolymer (BCP) film immediately after spin-coating when the BCP is disordered or in a highly ordered solvent-annealed film. Any patterns can be written into the BCP by crosslinking. Upon exposure to a preferential solvent for the minor component block followed by drying, cylindrical nanopores are generated within the nonexposed areas by a surface reconstruction process, while, in the exposed areas, the films remain unchanged. Nickel nanodot arrays can be placed over selected areas on a surface by thermal evaporation and lift-off process.
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Base de dados:
MEDLINE
Assunto principal:
Poliestirenos
/
Polivinil
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Cristalização
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Nanotecnologia
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Nanoestruturas
Idioma:
En
Ano de publicação:
2009
Tipo de documento:
Article