Imaging Structure and Composition Homogeneity of 300 mm SiGe Virtual Substrates for Advanced CMOS Applications by Scanning X-ray Diffraction Microscopy.

Zoellner, Marvin H; Richard, Marie-Ingrid; Chahine, Gilbert A; Zaumseil, Peter; Reich, Christian; Capellini, Giovanni; Montalenti, Francesco; Marzegalli, Anna; Xie, Ya-Hong; Schülli, Tobias U; Häberlen, Maik; Storck, Peter; Schroeder, Thomas

Zoellner, Marvin H; Richard, Marie-Ingrid; Chahine, Gilbert A; Zaumseil, Peter; Reich, Christian; Capellini, Giovanni; Montalenti, Francesco; Marzegalli, Anna; Xie, Ya-Hong; Schülli, Tobias U; Häberlen, Maik; Storck, Peter; Schroeder, Thomas.

Afiliação

Zoellner MH; IHP, Im Technologiepark 25, 15236 Frankfurt (Oder), Germany.
Richard MI; European Synchrotron Radiation Facility, BP 220, 38043 Grenoble Cedex, France.
Chahine GA; §Aix-Marseille Université, CNRS, IM2NP UMR 7334, 13397 Marseille Cedex 20, France.
Zaumseil P; European Synchrotron Radiation Facility, BP 220, 38043 Grenoble Cedex, France.
Reich C; IHP, Im Technologiepark 25, 15236 Frankfurt (Oder), Germany.
Capellini G; IHP, Im Technologiepark 25, 15236 Frankfurt (Oder), Germany.
Montalenti F; IHP, Im Technologiepark 25, 15236 Frankfurt (Oder), Germany.
Marzegalli A; â¥Dipartimento di Scienza dei Materiali, Università degli Studi di Milano-Bicocca, Via R. Cozzi 55, 20126 Milano, Italy.
Xie YH; â¥Dipartimento di Scienza dei Materiali, Università degli Studi di Milano-Bicocca, Via R. Cozzi 55, 20126 Milano, Italy.
Schülli TU; â¥Department of Materials Science and Engineering, University of California at Los Angeles, Los Angeles, California 90095-1595, United States.
Häberlen M; European Synchrotron Radiation Facility, BP 220, 38043 Grenoble Cedex, France.
Storck P; #Siltronic AG, Hans-Seidel-Platz 4, 81737 München, Germany.
Schroeder T; #Siltronic AG, Hans-Seidel-Platz 4, 81737 München, Germany.