Tuning Acid-Base Properties Using Mg-Al Oxide Atomic Layer Deposition.

Jackson, David H K; O'Neill, Brandon J; Lee, Jechan; Huber, George W; Dumesic, James A; Kuech, Thomas F.

Afiliação

Jackson DH; Materials Science Program, and Department of Chemical and Biological Engineering, University of Wisconsin - Madison, Madison, Wisconsin 53706, United States.
O'Neill BJ; Materials Science Program, and Department of Chemical and Biological Engineering, University of Wisconsin - Madison, Madison, Wisconsin 53706, United States.
Lee J; Materials Science Program, and Department of Chemical and Biological Engineering, University of Wisconsin - Madison, Madison, Wisconsin 53706, United States.
Huber GW; Materials Science Program, and Department of Chemical and Biological Engineering, University of Wisconsin - Madison, Madison, Wisconsin 53706, United States.
Dumesic JA; Materials Science Program, and Department of Chemical and Biological Engineering, University of Wisconsin - Madison, Madison, Wisconsin 53706, United States.
Kuech TF; Materials Science Program, and Department of Chemical and Biological Engineering, University of Wisconsin - Madison, Madison, Wisconsin 53706, United States.

ACS Appl Mater Interfaces ; 7(30): 16573-80, 2015 Aug 05.

Article em En | MEDLINE | ID: mdl-26168188