Ion source research and development at University of Jyväskylä: Studies of different plasma processes and towards the higher beam intensities.

Koivisto, H; Kalvas, T; Tarvainen, O; Komppula, J; Laulainen, J; Kronholm, R; Ranttila, K; Tuunanen, J; Thuillier, T; Xie, D; Machicoane, G.

Afiliação

Koivisto H; Department of Physics, University of Jyväskylä, P.O. Box 35 (YFL), FI-40014 Jyväskylä, Finland.
Kalvas T; Department of Physics, University of Jyväskylä, P.O. Box 35 (YFL), FI-40014 Jyväskylä, Finland.
Tarvainen O; Department of Physics, University of Jyväskylä, P.O. Box 35 (YFL), FI-40014 Jyväskylä, Finland.
Komppula J; Department of Physics, University of Jyväskylä, P.O. Box 35 (YFL), FI-40014 Jyväskylä, Finland.
Laulainen J; Department of Physics, University of Jyväskylä, P.O. Box 35 (YFL), FI-40014 Jyväskylä, Finland.
Kronholm R; Department of Physics, University of Jyväskylä, P.O. Box 35 (YFL), FI-40014 Jyväskylä, Finland.
Ranttila K; Department of Physics, University of Jyväskylä, P.O. Box 35 (YFL), FI-40014 Jyväskylä, Finland.
Tuunanen J; Department of Physics, University of Jyväskylä, P.O. Box 35 (YFL), FI-40014 Jyväskylä, Finland.
Thuillier T; LPSC, CNRS/IN2P3, Université Grenoble-Alpes1, 53 Rue des Martyrs, 38026 Grenoble Cedex, France.
Xie D; Lawrence Berkeley National Laboratory, One Cyclotron Road, Berkeley, California 94720, USA.
Machicoane G; National Superconducting Cyclotron Laboratory, Michigan State University, East Lansing, Michigan 48824, USA.

Rev Sci Instrum ; 87(2): 02A725, 2016 Feb.

Article em En | MEDLINE | ID: mdl-26931943

Texto completo: 1 Base de dados: MEDLINE Idioma: En Ano de publicação: 2016 Tipo de documento: Article

Texto completo: 1 Base de dados: MEDLINE Idioma: En Ano de publicação: 2016 Tipo de documento: Article