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Time-Dependent Negative Capacitance Effects in Al2O3/BaTiO3 Bilayers.
Kim, Yu Jin; Yamada, Hiroyuki; Moon, Taehwan; Kwon, Young Jae; An, Cheol Hyun; Kim, Han Joon; Kim, Keum Do; Lee, Young Hwan; Hyun, Seung Dam; Park, Min Hyuk; Hwang, Cheol Seong.
Afiliação
  • Kim YJ; Department of Materials Science & Engineering and Inter-University Semiconductor Research Center, Seoul National University , Seoul 151-744, Republic of Korea.
  • Yamada H; National Institute of Advanced Industrial Science and Technology (AIST) and JST, PRESTO , Higashi 1-1-1, Tsukuba, Ibaraki 305-8562, Japan.
  • Moon T; Department of Materials Science & Engineering and Inter-University Semiconductor Research Center, Seoul National University , Seoul 151-744, Republic of Korea.
  • Kwon YJ; Department of Materials Science & Engineering and Inter-University Semiconductor Research Center, Seoul National University , Seoul 151-744, Republic of Korea.
  • An CH; Department of Materials Science & Engineering and Inter-University Semiconductor Research Center, Seoul National University , Seoul 151-744, Republic of Korea.
  • Kim HJ; Department of Materials Science & Engineering and Inter-University Semiconductor Research Center, Seoul National University , Seoul 151-744, Republic of Korea.
  • Kim KD; Department of Materials Science & Engineering and Inter-University Semiconductor Research Center, Seoul National University , Seoul 151-744, Republic of Korea.
  • Lee YH; Department of Materials Science & Engineering and Inter-University Semiconductor Research Center, Seoul National University , Seoul 151-744, Republic of Korea.
  • Hyun SD; Department of Materials Science & Engineering and Inter-University Semiconductor Research Center, Seoul National University , Seoul 151-744, Republic of Korea.
  • Park MH; Department of Materials Science & Engineering and Inter-University Semiconductor Research Center, Seoul National University , Seoul 151-744, Republic of Korea.
  • Hwang CS; Department of Materials Science & Engineering and Inter-University Semiconductor Research Center, Seoul National University , Seoul 151-744, Republic of Korea.
Nano Lett ; 16(7): 4375-81, 2016 07 13.
Article em En | MEDLINE | ID: mdl-27231754
The negative capacitance (NC) effects in ferroelectric materials have emerged as the possible solution to low-power transistor devices and high-charge-density capacitors. Although the steep switching characteristic (subthreshold swing < sub-60 mV/dec) has been demonstrated in various devices combining the conventional transistors with ferroelectric gates, the actual applications of the NC effects are still some way off owing to the inherent hysteresis problem. This work reinterpreted the hysteretic properties of the NC effects within the time domain and demonstrated that capacitance (charge) boosting could be achieved without the hysteresis from the Al2O3/BaTiO3 bilayer capacitors through short-pulse charging. This work revealed that the hysteresis phenomenon in NC devices originated from the dielectric leakage of the dielectric layer. The suppression of charge injection via the dielectric leakage, which usually takes time, inhibits complete ferroelectric polarization switching during a short pulse time. It was demonstrated that a nonhysteretic NC effect can be achieved only within certain limited time and voltage ranges, but that these are sufficient for critical device applications.
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Texto completo: 1 Base de dados: MEDLINE Idioma: En Ano de publicação: 2016 Tipo de documento: Article

Texto completo: 1 Base de dados: MEDLINE Idioma: En Ano de publicação: 2016 Tipo de documento: Article