Cryogenic Etching of High Aspect Ratio 400 nm Pitch Silicon Gratings.

Miao, Houxun; Chen, Lei; Mirzaeimoghri, Mona; Kasica, Richard; Wen, Han.

Afiliação

Miao H; National Institutes of Health, Bethesda, MD 20892 USA.
Chen L; National Institute of Standards and Technology, Gaithersburg, MD 20899 USA.
Mirzaeimoghri M; National Institutes of Health, Bethesda, MD 20892 USA.
Kasica R; National Institute of Standards and Technology, Gaithersburg, MD 20899 USA.
Wen H; National Institutes of Health, Bethesda, MD 20892 USA.

J Microelectromech Syst ; 25(5): 963-967, 2016 10.

Article em En | MEDLINE | ID: mdl-27799726