"Atomic Force Masking" Induced Formation of Effective Hot Spots along Grain Boundaries of Metal Thin Films.

Kim, Kwang Hyun; Chae, Soo Sang; Jang, Seunghun; Choi, Won Jin; Chang, Hyunju; Lee, Jeong-O; Lee, Tae Il.

Afiliação

Kim KH; Department of Materials Science and Engineering, Yonsei University , Seoul 03722, South Korea.
Chae SS; Advanced Materials Division, Korea Research Institute of Chemical Technology (KRICT) , Daejeon 34114, South Korea.
Jang S; Advanced Materials Division, Korea Research Institute of Chemical Technology (KRICT) , Daejeon 34114, South Korea.
Choi WJ; Advanced Materials Division, Korea Research Institute of Chemical Technology (KRICT) , Daejeon 34114, South Korea.
Chang H; Materials and Science Engineering Department, University of Michigan , Ann Arbor, Michigan 48109, United States.
Lee JO; Advanced Materials Division, Korea Research Institute of Chemical Technology (KRICT) , Daejeon 34114, South Korea.
Lee TI; Advanced Materials Division, Korea Research Institute of Chemical Technology (KRICT) , Daejeon 34114, South Korea.

ACS Appl Mater Interfaces ; 8(47): 32094-32101, 2016 Nov 30.

Article em En | MEDLINE | ID: mdl-27933813