Two-dimensional WS2 nanoribbon deposition by conversion of pre-patterned amorphous silicon.
Nanotechnology
; 28(4): 04LT01, 2017 Jan 27.
Article
em En
| MEDLINE
| ID: mdl-27977414
ABSTRACT
We present a method for area selective deposition of 2D WS2 nanoribbons with tunable thickness on a dielectric substrate. The process is based on a complete conversion of a pre-patterned, H-terminated Si layer to metallic W by WF6, followed by in situ sulfidation by H2S. The reaction process, performed at 450 °C, yields nanoribbons with lateral dimension down to 20 nm and with random basal plane orientation. The thickness of the nanoribbons is accurately controlled by the thickness of the pre-deposited Si layer. Upon rapid thermal annealing at 900 °C under inert gas, the WS2 basal planes align parallel to the substrate.
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MEDLINE
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En
Ano de publicação:
2017
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Article