Computer simulations analysis for determining the polarity of charge generated by high energy electron irradiation of a thin film.

Malac, Marek; Hettler, Simon; Hayashida, Misa; Kawasaki, Masahiro; Konyuba, Yuji; Okura, Yoshi; Iijima, Hirofumi; Ishikawa, Isamu; Beleggia, Marco.

Afiliação

Malac M; National Institute of Nanotechnology, 11421 Saskatchewan Drive, T6G 2M9 Edmonton, Canada; Department of Physics, University of Alberta, T6G 2E1 Edmonton, Canada. Electronic address: mmalac@ualberta.ca.
Hettler S; Laboratorium für Elektronenmikroskopie, Karlsruher Institut für Technologie, Engesserstr. 7, D-76131 Karlsruhe, Germany.
Hayashida M; National Institute of Nanotechnology, 11421 Saskatchewan Drive, T6G 2M9 Edmonton, Canada.
Kawasaki M; JEOL USA Inc., 11 Dearborn Rd, Peabody, MA 01960, USA.
Konyuba Y; JEOL Ltd., 1-2 Musashino 3 chome, Akishima, Tokyo 198-8558, Japan.
Okura Y; JEOL Ltd., 1-2 Musashino 3 chome, Akishima, Tokyo 198-8558, Japan.
Iijima H; JEOL Ltd., 1-2 Musashino 3 chome, Akishima, Tokyo 198-8558, Japan.
Ishikawa I; JEOL Ltd., 1-2 Musashino 3 chome, Akishima, Tokyo 198-8558, Japan.
Beleggia M; Center for Electron Nanoscopy, Technical University of Denmark, 2800 Kgs. Lyngby, Denmark.