Controlled Electrochemical Intercalation of Graphene/h-BN van der Waals Heterostructures.

Zhao, S Y Frank; Elbaz, Giselle A; Bediako, D Kwabena; Yu, Cyndia; Efetov, Dmitri K; Guo, Yinsheng; Ravichandran, Jayakanth; Min, Kyung-Ah; Hong, Suklyun; Taniguchi, Takashi; Watanabe, Kenji; Brus, Louis E; Roy, Xavier; Kim, Philip.

Afiliação

Zhao SYF; Department of Physics, Harvard University , Cambridge, Massachusetts 02138, United States.
Elbaz GA; Department of Chemistry, Columbia University , New York, New York 10027, United States.
Bediako DK; Department of Physics, Harvard University , Cambridge, Massachusetts 02138, United States.
Yu C; Department of Physics, Harvard University , Cambridge, Massachusetts 02138, United States.
Efetov DK; Department of Physics, Columbia University , New York, New York 10027, United States.
Guo Y; Department of Chemistry, Columbia University , New York, New York 10027, United States.
Ravichandran J; Department of Physics, Harvard University , Cambridge, Massachusetts 02138, United States.
Min KA; Department of Physics and Graphene Research Institute, Sejong University , Seoul 143-747, South Korea.
Hong S; Department of Physics and Graphene Research Institute, Sejong University , Seoul 143-747, South Korea.
Taniguchi T; National Institute for Materials Science , 1-1 Namiki, Tsukuba, Ibaraki 305-0044, Japan.
Watanabe K; National Institute for Materials Science , 1-1 Namiki, Tsukuba, Ibaraki 305-0044, Japan.
Brus LE; Department of Chemistry, Columbia University , New York, New York 10027, United States.
Roy X; Department of Chemistry, Columbia University , New York, New York 10027, United States.
Kim P; Department of Physics, Harvard University , Cambridge, Massachusetts 02138, United States.