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Investigation of Energy Band at Atomic-Layer-Deposited ZnO/ß-Ga2O3 ([Formula: see text]) Heterojunctions.
Sun, Shun-Ming; Liu, Wen-Jun; Xiao, Yi-Fan; Huan, Ya-Wei; Liu, Hao; Ding, Shi-Jin; Zhang, David Wei.
Afiliação
  • Sun SM; State Key Laboratory of ASIC and System, School of Microelectronics, Fudan University, Shanghai, 200433, China.
  • Liu WJ; State Key Laboratory of ASIC and System, School of Microelectronics, Fudan University, Shanghai, 200433, China. wjliu@fudan.edu.cn.
  • Xiao YF; State Key Laboratory of ASIC and System, School of Microelectronics, Fudan University, Shanghai, 200433, China.
  • Huan YW; State Key Laboratory of ASIC and System, School of Microelectronics, Fudan University, Shanghai, 200433, China.
  • Liu H; State Key Laboratory of ASIC and System, School of Microelectronics, Fudan University, Shanghai, 200433, China.
  • Ding SJ; State Key Laboratory of ASIC and System, School of Microelectronics, Fudan University, Shanghai, 200433, China. sjding@fudan.edu.cn.
  • Zhang DW; State Key Laboratory of ASIC and System, School of Microelectronics, Fudan University, Shanghai, 200433, China.
Nanoscale Res Lett ; 13(1): 412, 2018 Dec 24.
Article em En | MEDLINE | ID: mdl-30584649
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Texto completo: 1 Base de dados: MEDLINE Idioma: En Ano de publicação: 2018 Tipo de documento: Article

Texto completo: 1 Base de dados: MEDLINE Idioma: En Ano de publicação: 2018 Tipo de documento: Article