MoS<sub>2</sub> for Enhanced Electrical Performance of Ultrathin Copper Films.

Shen, Tingting; Valencia, Daniel; Wang, Qingxiao; Wang, Kuang-Chung; Povolotskyi, Michael; Kim, Moon J; Klimeck, Gerhard; Chen, Zhihong; Appenzeller, Joerg

MoS₂ for Enhanced Electrical Performance of Ultrathin Copper Films.

Shen, Tingting; Valencia, Daniel; Wang, Qingxiao; Wang, Kuang-Chung; Povolotskyi, Michael; Kim, Moon J; Klimeck, Gerhard; Chen, Zhihong; Appenzeller, Joerg.

Afiliação

Valencia D; The Charles Stark Draper Laboratory Inc. , Cambridge , Massachusetts 02139 , United States.
Wang Q; Department of Materials Science and Engineering , University of Texas at Dallas , Richardson , Texas 75080 , United States.
Kim MJ; Department of Materials Science and Engineering , University of Texas at Dallas , Richardson , Texas 75080 , United States.

ACS Appl Mater Interfaces ; 11(31): 28345-28351, 2019 Aug 07.

Article em En | MEDLINE | ID: mdl-31287653