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In Situ Formation of Ge Nanoparticles by Annealing of Al-Ge-N Thin Films Followed by HAXPES and XRD.
von Fieandt, Kristina; Johansson, Fredrik O L; Balmes, Olivier; Lindblad, Rebecka; Riekehr, Lars; Lindblad, Andreas; Lewin, Erik.
Afiliação
  • von Fieandt K; Inorganic Chemistry Research Programme, Department of Chemistry - Ångström Laboratory , Uppsala University , Box 538, SE-75121 Uppsala , Sweden.
  • Johansson FOL; Division of Molecular and Condensed Matter Physics, Department of Physics and Astronomy , Uppsala University , Box 516, SE-75120 Uppsala , Sweden.
  • Balmes O; MAX IV Laboratory , Lund University , PO Box 118, SE-22100 Lund , Sweden.
  • Lindblad R; Inorganic Chemistry Research Programme, Department of Chemistry - Ångström Laboratory , Uppsala University , Box 538, SE-75121 Uppsala , Sweden.
  • Riekehr L; Inorganic Chemistry Research Programme, Department of Chemistry - Ångström Laboratory , Uppsala University , Box 538, SE-75121 Uppsala , Sweden.
  • Lindblad A; Division of Molecular and Condensed Matter Physics, Department of Physics and Astronomy , Uppsala University , Box 516, SE-75120 Uppsala , Sweden.
  • Lewin E; Inorganic Chemistry Research Programme, Department of Chemistry - Ångström Laboratory , Uppsala University , Box 538, SE-75121 Uppsala , Sweden.
Inorg Chem ; 58(16): 11100-11109, 2019 Aug 19.
Article em En | MEDLINE | ID: mdl-31381309

Texto completo: 1 Base de dados: MEDLINE Idioma: En Ano de publicação: 2019 Tipo de documento: Article

Texto completo: 1 Base de dados: MEDLINE Idioma: En Ano de publicação: 2019 Tipo de documento: Article