Defect Analysis and Reliability Characteristics of (HfZrO4)1-x(SiO2)x High-&#954; Dielectrics.

Defect Analysis and Reliability Characteristics of (HfZrO4)_1-x(SiO2)x High-_κ Dielectrics.

Park, Areum; Choi, Pyungho; Jeon, Woojin; Lee, Donghyeon; Choi, Donghee; Choi, Byoungdeog.

Afiliação

Park A; Department of Electrical and Computer Engineering, Sungkyunkwan University, Suwon 16419, Republic of Korea.
Choi P; Department of Electrical and Computer Engineering, Sungkyunkwan University, Suwon 16419, Republic of Korea.
Jeon W; Department of Electrical and Computer Engineering, Sungkyunkwan University, Suwon 16419, Republic of Korea.
Lee D; Department of Electrical and Computer Engineering, Sungkyunkwan University, Suwon 16419, Republic of Korea.
Choi D; Department of Electrical and Computer Engineering, Sungkyunkwan University, Suwon 16419, Republic of Korea.
Choi B; Department of Electrical and Computer Engineering, Sungkyunkwan University, Suwon 16419, Republic of Korea.

J Nanosci Nanotechnol ; 20(11): 6718-6722, 2020 11 01.

Article em En | MEDLINE | ID: mdl-32604504

Texto completo: 1 Base de dados: MEDLINE Idioma: En Ano de publicação: 2020 Tipo de documento: Article

Texto completo: 1 Base de dados: MEDLINE Idioma: En Ano de publicação: 2020 Tipo de documento: Article